Mr. Akihide Shirotori Profile

Akihide Shirotori

at Zeon Corp

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Author

Publications (8)

Proceedings Article | 9 April 2024 Presentation + Paper

Main chain scission resists towards high-NA EUV lithography

Akihide Shirotori, Yuji Oda, Rui Zhang, Kazunori Taguchi, Nobuhiro Sato, Sin Fu Yeh , Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12957, 129570P (2024) https://doi.org/10.1117/12.3009737

KEYWORDS: Extreme ultraviolet lithography, Lithography, Polymers, Extreme ultraviolet, Film thickness, Etching, Electron beam lithography, Optical lithography, Photoresist materials, Critical dimension metrology

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Proceedings Article | 9 April 2024 Poster + Paper

Studies on resolution with ZEP530A for EUV mask

Akihide Shirotori, Takashi Tsutsumi, Sin Fu Yeh, Kenji Kuroyanagi

Proceedings Volume 12956, 129560U (2024) https://doi.org/10.1117/12.3010109

KEYWORDS: Lithography, Polymers, Solubility, Extreme ultraviolet, Design, Viscosity, Line edge roughness, Bridges, Extreme ultraviolet lithography, Electron beam lithography

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Proceedings Article | 21 November 2023 Poster + Paper

Update on main chain scission resists in Zeon for high-NA EUV lithography

Akihide Shirotori, Yuji Oda, Kazunori Taguchi, Sin Fu Yeh, Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12750, 127500U (2023) https://doi.org/10.1117/12.2686602

KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Polymers, Lithography, Stochastic processes, Scanners, Printing, High volume manufacturing, Extreme ultraviolet, Polymer thin films

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Proceedings Article | 1 May 2023 Presentation + Paper

Development on main chain scission resists for high-NA EUV lithography

Akihide Shirotori, Manabu Hoshino, Makoto Fujimura, Sin Fu Yeh , Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12498, 1249807 (2023) https://doi.org/10.1117/12.2657506

KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Scanners, Photoresist materials, Compact discs, Coating, Etching, Electron beam lithography

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Proceedings Article | 25 May 2022 Presentation + Paper

Improved resolution with main chain scission resists for EUV lithography

Akihide Shirotori, Manabu Hoshino, Ashish Rathore, SinFu Yeh , Danilo De Simone, Geert Vandenberghe, Hirokazu Matsumoto

Proceedings Volume 12055, 120550E (2022) https://doi.org/10.1117/12.2613445

KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Electron beam lithography, Etching, Photoresist processing, Optical lithography, Photoresist materials, Photomasks

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Proceedings Article | 29 September 2021 Presentation

Patterning performance with main chain scission type photoresist for EUV lithography

Akihide Shirotori, Manabu Hoshino, Danilo De Simone, Geert Vandenberghe, Hirokazu Matsumoto

Proceedings Volume 11854, 118540O (2021) https://doi.org/10.1117/12.2600855

KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Photoresist materials, Photoresist developing, Stochastic processes, Printing, Polymers, Photoresist processing, Lithography, Extreme ultraviolet

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Proceedings Article | 13 October 2020 Presentation + Paper

A novel main chain scission type photoresists for EUV lithography

A. Shirotori, M. Hoshino, D. De Simone, G. Vandenberghe, H. Matsumoto

Proceedings Volume 11517, 115170D (2020) https://doi.org/10.1117/12.2572582

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Lithography, Stochastic processes, Printing, Extreme ultraviolet, Electron beam lithography, Line edge roughness, Polymers

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Proceedings Article | 26 September 2019 Presentation + Paper

Development of main chain scission type photoresists for EUV lithography

A. Shirotori, Y. Vesters, M. Hoshino, A. Rathore, D. De Simone, G. Vandenberghe, H. Matsumoto

Proceedings Volume 11147, 111470J (2019) https://doi.org/10.1117/12.2536348

KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Photoresist materials, Photoresist developing, Extreme ultraviolet, Electron beam lithography, Line width roughness, Semiconducting wafers, Line edge roughness

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Showing 5 of 8 publications

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