Mr. Akitoshi Kawai Profile

Akitoshi Kawai

at Nikon Tsubasa Inc

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Author

Publications (4)

Proceedings Article | 2 April 2010 Paper

New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, Kazumasa Endo, Kiminori Yoshino, Yuuichiro Yamazaki, Kuniharu Nagashima, Kenji Tsuchiya

Proceedings Volume 7638, 76380E (2010) https://doi.org/10.1117/12.846336

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Birefringence, Reflectivity, Photoresist materials, Polarization, Objectives, Astronomical imaging, Semiconductors

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Proceedings Article | 24 March 2009 Paper

Hole inspection technology using Fourier imaging method

Kiminori Yoshino, Kenji Tsuchiya, Yuuichiro Yamazaki, Makoto Oote, Koichiro Shibayama, Akitoshi Kawai, Kazumasa Endo

Proceedings Volume 7272, 72723H (2009) https://doi.org/10.1117/12.813634

KEYWORDS: Semiconducting wafers, Diffraction, Polarizers, Inspection, Critical dimension metrology, Objectives, Image analysis, Polarization, Photoresist materials, Process control

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Proceedings Article | 23 March 2009 Paper

New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Akitoshi Kawai, Fuminori Hayano, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 7272, 727219 (2009) https://doi.org/10.1117/12.814046

KEYWORDS: Diffraction, Semiconducting wafers, Critical dimension metrology, Inspection, Optical simulations, Wafer testing, Wafer-level optics, Polarization, Birefringence

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Proceedings Article | 24 March 2008 Paper

Novel CD inspection technology leveraging a form birefringence in a Fourier space

Akitoshi Kawai, Daisaku Mochida, Kiminori Yoshino, Yuuichiro Yamazaki

Proceedings Volume 6922, 69221X (2008) https://doi.org/10.1117/12.771889

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Inspection, Birefringence, Polarization, Polarizers, Scanning electron microscopy, Objectives, Edge roughness, Data modeling

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