Albert Chung-Hsun Li
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Data modeling, Time metrology, Process modeling, Instrument modeling, Error analysis, Process control, Yield improvement

Proceedings Article | 29 March 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconducting wafers, Metrology, Overlay metrology, Time metrology, Process control, Lithography, Tin, Feedback control, Scanners, Optical lithography

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