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Aleksei Shulyatev
at National Research Univ of Electronic Technlogy
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Publications (1)
Proceedings Article | 30 December 2016 Paper
Investigation of the reactive ion etching of Ge2Sb2Te5 thin films
A. Shulyatev, A. Sherchenkov, D. Gromov, P. Lazarenko, A. Sysa, A. Kozmin
Proceedings Volume 10224, 102241Y (2016) https://doi.org/10.1117/12.2267138
KEYWORDS: Etching, Thin films, Reactive ion etching, Tellurium, Atomic force microscopy, Germanium, Antimony, Argon, Scanning electron microscopy, Surface roughness
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