Dr. Alex Zepka
Staff Engineer at Synopsys Inc
SPIE Involvement:
Author
Area of Expertise:
E-Beam Lithography , Proximity Correction , Direct-Write Lithography , Mask Data Prep , Mask Error Correction
Websites:
Profile Summary

I have been working as the technical lead in several projects in the area of E-Beam Proximity Correction and Data Preparation for New Generation Lithography (NGL). I have extensive experience in customer support as well as technology development. I was one of the Group Leader in the European-sponsored MAGIC project, managing the software datapath development for Multi-Beam Direct-Write technology. I have a similar role in the IMAGINE project for MBDW as well as other efforts in NGL
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