Dr. Alexander Efremov Profile

Dr. Alexander Efremov

at State Univ of Chemistry and Technology

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Author

Publications (7)

Proceedings Article | 30 December 2016 Paper

Plasma parameters and active species kinetics in CF4/O2/Ar gas mixture: effects of CF4/O2 and O2/Ar mixing ratios

Junmyung Lee, Kwang-Ho Kwon, A. Efremov

Proc. SPIE. 10224, International Conference on Micro- and Nano-Electronics 2016

KEYWORDS: Etching, Argon, Chemical species, Dry etching, Polymers, Ions, Oxygen, Carbon monoxide, Autoregressive models, Plasma

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Proceedings Article | 30 December 2016 Paper

Comparative study of CF4- and CHF3-based plasmas for dry etching applications

A. Efremov, K.-H. Kwon, A. Morgunov, D. Shabadarova

Proc. SPIE. 10224, International Conference on Micro- and Nano-Electronics 2016

KEYWORDS: Etching, Argon, Chemical species, Dry etching, Molecules, Ions, Plasmas, Chemistry, Carbon monoxide, Autoregressive models

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Proceedings Article | 8 January 2013 Paper

The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition

A. Efremov, A. Yudina, A. Davlyatshina, D. Murin, V. Svetsov

Proc. SPIE. 8700, International Conference Micro- and Nano-Electronics 2012

KEYWORDS: Argon, Chemical species, Ions, Gases, Diffusion, Oxygen, Ionization, Chlorine, Plasma, Protactinium

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SPIE Journal Paper | 1 April 2009

Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl₂/Ar plasma

Tae-Hoon Lee, Alexander Efremov, Yong-Hyun Ham, Sun Jin Yun, Nam-Ki Min, Munpyo Hong, Kwang-Ho Kwon

JM3 Vol. 8 Issue 02

KEYWORDS: Chlorine, Argon, Etching, Plasma, Ions, Autoregressive models, Vanadium, Plasma etching, Chemical species, Sputter deposition

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Proceedings Article | 10 June 2006 Paper

A self-consistent model for the HCl dc glow discharge: plasma parameters and active particles kinetics

A. Efremov, V. Svettsov

Proc. SPIE. 6260, Micro- and Nanoelectronics 2005

KEYWORDS: Chemical species, Particles, Molecules, Ions, Diffusion, Ionization, Human-computer interaction, Chlorine, Plasma, Protactinium

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Proceedings Article | 28 May 2004 Paper

Volume and heterogeneous chemistry in Cl2/Ar inductively coupled plasma

Alexander Efremov, Vladimir Svettsov, Chang-Il Kim

Proc. SPIE. 5401, Micro- and Nanoelectronics 2003

KEYWORDS: Argon, Chemical species, Particles, Molecules, Ions, Chemistry, Ionization, Chlorine, Autoregressive models, Plasma

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Proceedings Article | 28 May 2004 Paper

Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

Alexander Efremov, Vladimir Svettsov, Chang-Il Kim

Proc. SPIE. 5401, Micro- and Nanoelectronics 2003

KEYWORDS: Gold, Thin films, Etching, Argon, Chemical species, Sputter deposition, Ions, Chlorine, Autoregressive models, Plasma

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Showing 5 of 7 publications

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