Dr. Alexander Lajn
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Polymers, Chemistry, Oxygen, Process control, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Photomask technology

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Mirrors, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Optics manufacturing, Ruthenium, EUV optics

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Diffractive optical elements, Etching, Chromium, Atomic force microscopy, Oxygen, Scanning electron microscopy, Photomasks, Critical dimension metrology, Reactive ion etching, Molybdenum, Phase shifts

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