Dr. Alexander A. Schafgans
at Cymer LLC
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Laser applications, Laser stabilization, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 9 September 2019 Presentation
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, High volume manufacturing

Proceedings Article | 10 May 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scanners, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, EUV optics, Plasma, Tin

Proceedings Article | 5 May 2017 Presentation
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Current controlled current source

Showing 5 of 10 publications
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