Dr. Alexei L. Bogdanov
Technologist at Western Digital
SPIE Involvement:
Publications (13)

SPIE Journal Paper | 7 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Silicon, Magnetism, Chromium, Oxygen, Directed self assembly, Double patterning technology, Nanoimprint lithography, Reactive ion etching

Proceedings Article | 11 January 2008 Paper
Proc. SPIE. 6800, Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV
KEYWORDS: Lithography, Electron beam lithography, Stars, Waveguides, Scattering, Etching, Silicon, Chromium, Scanning electron microscopy, Aluminum

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Fabrication, Lithography, Electron beam lithography, Holography, Manufacturing, Reflectivity, Scanning electron microscopy, Photoresist materials, Semiconducting wafers, Diffraction gratings

Proceedings Article | 1 March 2006 Paper
Proc. SPIE. 6125, Silicon Photonics
KEYWORDS: Amorphous silicon, GRIN lenses, Refractive index, Waveguides, Polarization, Etching, Silicon, Wave propagation, Waveguide modes, Tolerancing

Showing 5 of 13 publications
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