Mr. Alfons Zoeller Profile

Alfons Zoeller

Dipl. Ing. at Bühler Alzenau GmbH

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Author

Publications (17)

Proceedings Article | 23 September 2015 Paper

High efficiency RF-plasma source with increased energy range

D. Arhilger, H. Hagedorn, H. Reus, A. Zöller

Proceedings Volume 9627, 96270O (2015) https://doi.org/10.1117/12.2191344

KEYWORDS: Silica, Ions, Plasma, Energy efficiency, Optical coatings, Refractive index, Argon, Neodymium, Scattering, Titanium dioxide

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Proceedings Article | 23 September 2015 Paper

Advanced optical monitoring system using a new developed low noise wideband spectrometer system

Alfons Zöller, Detlef Arhilger, Michael Boos, Harro Hagedorn

Proceedings Volume 9627, 962712 (2015) https://doi.org/10.1117/12.2191269

KEYWORDS: Spectroscopy, Sensors, Control systems, Transmittance, Glasses, Detector arrays, Signal detection, Interference (communication), Optical coatings, Light

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Proceedings Article | 5 October 2011 Paper

Testglass changer for direct optical monitoring

A. Zoeller, H. Hagedorn, W. Weinrich, E. Wirth

Proceedings Volume 8168, 81681J (2011) https://doi.org/10.1117/12.896859

KEYWORDS: Transmittance, Coating, Multilayers, Glasses, Computer simulations, Optical testing, Optical filters, Crystal optics, Monochromators, Thin films

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Proceedings Article | 25 September 2008 Paper

Computer simulation of coating processes with monochromatic monitoring

A. Zöller, M. Boos, H. Hagedorn, B. Romanov

Proceedings Volume 7101, 71010G (2008) https://doi.org/10.1117/12.797612

KEYWORDS: Coating, Computer simulations, Refractive index, Transmittance, Error analysis, Interference (communication), Multilayers, Linear filtering, Sputter deposition, Signal processing

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Proceedings Article | 25 September 2008 Paper

Plasma ion-assisted deposition with radio frequency powered plasma sources

H. Hagedorn, M. Klosch, H. Reus, A. Zoeller

Proceedings Volume 7101, 710109 (2008) https://doi.org/10.1117/12.797818

KEYWORDS: Ions, Plasma, Optical coatings, Silica, Radio optics, Refractive index, Interference filters, Transmittance, Surface roughness, Titanium dioxide

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Proceedings Article | 25 September 2008 Paper

High performance notch filter coatings produced with PIAD and magnetron sputtering

M. Scherer, U. Schallenberg, H. Hagedorn, W. Lehnert, B. Romanov, A. Zoeller

Proceedings Volume 7101, 71010I (2008) https://doi.org/10.1117/12.797699

KEYWORDS: Linear filtering, Transmittance, Sputter deposition, Refractive index, Silica, Manufacturing, Absorbance, Optical coatings, Optical filters, Apodization

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Proceedings Article | 14 May 2007 Paper

Software tools for studying optical manufacturability with modern monochromatic monitoring devices

Alexander Tikhonravov, Michael Trubetskov, Jennifer Kruschwitz, Alfons Zoller, Harro Hagedorn, Boris Romanov, Michael Boos

Proceedings Volume 10316, 103161K (2007) https://doi.org/10.1117/12.718119

KEYWORDS: Optical coatings, Optics manufacturing, Coating, Mirrors, Transmittance, Error analysis, Refractive index, Optical engineering, Manufacturing, Optical fabrication

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Proceedings Article | 6 October 2005 Paper

Substantial progress in optical monitoring by intermittent measurement technique

A. Zoeller, M. Boos, R. Goetzelmann, H. Hagedorn, W. Klug

Proceedings Volume 5963, 59630D (2005) https://doi.org/10.1117/12.624865

KEYWORDS: Optical coatings, Transmittance, Bandpass filters, Sputter deposition, Polarizers, Glasses, Antireflective coatings, Linear filtering, Sensors, Thin films

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Proceedings Article | 5 October 2005 Paper

Oxide and fluoride coatings for the excimer wavelength 193nm

Rainer Götzelmann, Harro Hagedorn, Alfons Zöller, Alexei Kobiak, Werner Klug

Proceedings Volume 5963, 59630L (2005) https://doi.org/10.1117/12.625152

KEYWORDS: Reflectivity, Plasma, Oxides, Optical coatings, Deep ultraviolet, Mirrors, Aluminum, Silica, Thin film coatings, Absorption

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Proceedings Article | 19 October 2000 Paper

Design and manufacturing of WDM narrow-band interference filters

Ralf Faber, Keqi Zhang, Alfons Zoeller

Proceedings Volume 4094, (2000) https://doi.org/10.1117/12.404748

KEYWORDS: Bandpass filters, Wavelength division multiplexing, Optical filters, Optics manufacturing, Absorption, Interference filters, Refractive index, Manufacturing, Thin films, Control systems

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Proceedings Article | 7 September 1999 Paper

UV coatings produced with plasma-ion-assisted deposition

Rainer Goetzelmann, Harro Hagedorn, Alfons Zoeller

Proceedings Volume 3738, (1999) https://doi.org/10.1117/12.360126

KEYWORDS: Transmittance, Plasma, Optical coatings, Absorption, Silica, Optical filters, Scattering, Multilayers, Reflectivity, Laser scattering

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Proceedings Article | 1 November 1997 Paper

Fullerene plasma deposition: its potential for optical carbon coatings

Ulf Brauneck, S. Dieckhoff, Alfons Zoeller, Hans Gerd Busmann

Proceedings Volume 3142, (1997) https://doi.org/10.1117/12.283762

KEYWORDS: Carbon, Fullerenes, Plasma, Absorption, Ion beams, Optical coatings, Plasmons, Ions, Argon, Visible radiation

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Tetrahedral carbon thin films in amorphous modifications (ta-C) are ofinterest for applications due to their excellent hardness, chemical inertness, low friction, and low wear rates. They are obtained by mass-selected and monoenergetic carbon ion beam deposition and by laser ablation ofgraphite '' . The need ofan ion beam with a narrow distributed kinetic energy per C-atom is currently a fundamental obstacle for the use of such thin films in large area and high volume applications. More recently, the deposition of ions abstracted from a radio frequency excited acetylene plasma has yield a hydrogenated form oftetrahedral carbon with properties comparable to ta-C '.An important technological progress can be expected if an ion source can be made available that delivers carbon ions with a narrow-distributed kinetic energy per Catom, that can easily be scaled up, and that can be integrated into existing deposition systems. Due to their high vapour pressure, fullerenes can easily be sublimed and introduced into ion beam and plasma systems and thus have a potential for the deposition oftetrahedral carbon films by relatively simple technological means. The first approach to the use of fullerenes for the deposition oftetrahedral carbon was a cluster ion beam experiment ,in which fullerene ions were accelerated and disintegrated at their impact on a substrate. In another way, fullerenes can be used to generate a plasma ofhigh C2-content due to the effective dissociation ofstrongly heated fullerenes by C2-emission 6 The first use of such a plasma was a chemical vapour deposition experiment, in which fullerenes were dissociated in an argon microwave plasma and nanocrystalline diamond was grown6. The films obtained hereby show superior surface smoothness, low friction and low wear rates .Forthe deposition of amorphous carbon, a Kaufmann-source supplied with fu8 and a radio-frequency (RF) plasma source supplied with fullerenes and argon 10have been applied. Here we report on the ion beam deposition of amorphous carbon by using a fullerene argon plasma without the admixture ofhydrogen. The films are characterized regarding their Raman-emission, their plasmon loss structure and valence band spectra acquired by high-resolution X-Ray photoelectron spectroscopy (XPS), their optical absorption in the visible wavelength regime, and their wetting angles.

Proceedings Article | 1 October 1997 Paper

Plasma-ion-assisted deposition: a powerful technology for the production of optical coatings

Alfons Zoeller, Rainer Goetzelmann, Harro Hagedorn, Werner Klug, K. Matl

Proceedings Volume 3133, (1997) https://doi.org/10.1117/12.290193

KEYWORDS: Coating, Plasma, Optical filters, Refractive index, Ions, Optical coatings, Transmittance, Temperature metrology, Glasses, Antireflective coatings

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Proceedings Article | 19 August 1996 Paper

Plasma-ion-assisted deposition: investigation of film stress

Alfons Zoeller, Rainer Goetzelmann, K. Matl

Proceedings Volume 2776, (1996) https://doi.org/10.1117/12.246816

KEYWORDS: Optical coatings, Plasma, Glasses, Ions, Multilayers, Thin films, Thin film coatings, Dielectrics, Magnetism, Oxides

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Proceedings Article | 4 November 1994 Paper

Plasma-ion-assisted-deposition: a novel technique for the production of optical coatings

Alfons Zoeller, S. Beisswenger, Rainer Goetzelmann, K. Matl

Proceedings Volume 2253, (1994) https://doi.org/10.1117/12.192112

KEYWORDS: Plasma, Ions, Optical coatings, Refractive index, Reflectivity, Thin film coatings, Metals, Oxides, Absorption, Reflection

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Proceedings Article | 1 December 1990 Paper

Plasma-enhanced CVD hard coatings for opthalmic optics

Werner Klug, Roland Schneider, Alfons Zoeller

Proceedings Volume 1323, (1990) https://doi.org/10.1117/12.22376

KEYWORDS: Plasma enhanced chemical vapor deposition, Chromium, Lenses, Resistance, Coating, Antireflective coatings, Hard coatings, Refractive index, Thin films, Laser damage threshold

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Proceedings Article | 1 August 1990 Paper

Large-area IAD with a new plasma source

Alfons Zoeller, Rainer Goetzelmann, Reinhard Herrmann, K. Matl

Proceedings Volume 1270, (1990) https://doi.org/10.1117/12.20377

KEYWORDS: Plasma, Coating, Oxygen, Ions, Thin films, Argon, Dielectrics, Copper, Tungsten, Ion beams

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Showing 5 of 17 publications

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