Dr. Alfred J. Reich
Manager at Freescale Semiconductor Inc
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 14 March 2006 Paper
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Manufacturing, Control systems, Electroluminescence, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Statistical analysis, Data modeling, Databases, Error analysis, Photomasks, Optical proximity correction, Product engineering, Statistical modeling, Resolution enhancement technologies

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Optical proximity correction

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Digital signal processing, Data storage, Databases, Computer programming, Photomasks, Product engineering, Photomask technology, Computer programming languages

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Mirrors, Manufacturing, Inspection, Space mirrors, Very large scale integration, Photomasks, Computer aided design, Semiconducting wafers, Wafer manufacturing, Algorithms

Showing 5 of 12 publications
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