Ms. Alice Pelletier Profile

Alice Pelletier

at stmicroelectronics

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 24 March 2016 Paper

Resist 3D model based OPC for 28nm metal process window enlargement

P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Optical lithography, Calibration, Etching, Metals, Image processing, Reliability, 3D modeling, Scanning electron microscopy, 3D metrology, Photomasks, Artificial intelligence, Optical proximity correction, Critical dimension metrology, Evolutionary algorithms

Read Abstract +

SPIE Journal Paper | 10 April 2015

Patterning critical dimension control for advanced logic nodes

Bertrand Le-Gratiet, Jean De-Caunes, Maxime Gatefait, Auguste Lam, Alain Ostrovsky, Jonathan Planchot, Vincent Farys, Julien Ducoté, Marc Mikolajczak, Vincent Morin, Nicolas Chojnowski, Frank Sundermann, Alice Pelletier, Regis Bouyssou, Cedric Monget, Jean-Damien Chapon, Bastien Orlando, Laurene Babaud, Céline Lapeyre, Emek Yesilada, Anna Szucs, Jean-Christophe Michel, Latifa Desvoivres, Onintza Ros Bengoechea, Pascal Gouraud

JM3 Vol. 14 Issue 02

KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

Read Abstract +

Proceedings Article | 17 October 2014 Paper

How holistic process control translates into high mix logic fab APC?

B. Le-Gratiet, M. Gatefait, J. Ducotè, J. Decaunes, A. Lam, B. Beraud, M. Mikolajczak, A. Pelletier, B. Orlando, F. Sundermann, A. Ostrovsky, C. Lapeyre

Proc. SPIE. 9231, 30th European Mask and Lithography Conference

KEYWORDS: Metrology, Logic, Data modeling, Databases, Etching, Scanners, Control systems, Process control, Photomasks, Semiconducting wafers

Read Abstract +

Proceedings Article | 5 April 2012 Paper

Integration and automation of DoseMapper in a logic fab APC system: application for 45/40/28nm node

Bertrand Le Gratiet, Christophe Salagnon, Jean de Caunes, Marc Mikolajczak, Vincent Morin, Nicolas Chojnowski, Frank Sundermann, Jean Massin, Alice Pelletier, Joel Metz, Yoann Blancquaert, Regis Bouyssou, Arthur Pelissier, Olivier Belmont, Anne Strapazzon, Anna Phillips, Thierry Devoivre, Emilie Bernard, Estelle Batail, Lionel Thevenon, Benedicte Bry, Fabrice Bernard-Granger, Ahmed Oumina, Marie-Pierre Baron, Didier Gueze

Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI

KEYWORDS: Lithography, Metrology, Logic, Databases, Etching, Scanners, Control systems, Process control, Photomasks, Semiconducting wafers

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years