Dr. Allen Keith Bates Profile

Dr. Allen Keith Bates

Optical Metrology Engineer

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Publications (6)

Proceedings Article | 5 July 2000 Paper

Long-term testing of optical components for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Kevin Orvek

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389037

KEYWORDS: Sensors, Lithography, Absorption, Reflectors, Optical components, Calcium, Dielectrics, Silica, Reflectivity, Optical testing

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Proceedings Article | 26 July 1999 Paper

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Chris Van Peski

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354323

KEYWORDS: Absorption, Silica, Calcium, Lithography, Birefringence, Laser applications, Optical components, Beam splitters, Pulsed laser operation, Ozone

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Proceedings Article | 7 April 1999 Paper

Marathon testing of optical materials for 193-nm lithographic applications

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Chris Van Peski

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344432

KEYWORDS: Absorption, Silica, Optical coatings, Reflectivity, Lithography, Calcium, Surface roughness, Transmittance, Surface finishing, Pulsed laser operation

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Proceedings Article | 27 October 1998 Paper

Testing of optical materials for 193-nm applications

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3427, (1998) https://doi.org/10.1117/12.328512

KEYWORDS: Absorption, Silica, Lithography, Optical coatings, Calcium, Antireflective coatings, Birefringence, Pulsed laser operation, Reflectivity, Beam splitters

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Proceedings Article | 29 June 1998 Paper

Damage testing of pellicles for 193-nm lithography

Vladimir Liberman, Roderick Kunz, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310776

KEYWORDS: Pellicles, Reticles, Nitrogen, Ozone, Polymers, Refractive index, Lithography, Absorption, Surface roughness, Spectroscopy

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Proceedings Article | 29 June 1998 Paper

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310775

KEYWORDS: Absorption, Optical coatings, Excimer lasers, Interferometry, Reflectivity, Antireflective coatings, Lithography, Calorimetry, Dielectrics, Nitrogen

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Showing 5 of 6 publications

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