Dr. Allen H. Gabor
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Conference Program Committee | Author
Publications (36)

Proceedings Article | 6 May 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Metrology, Surface plasmons, Optical lithography, Data modeling, Etching, Neural networks, Reactive ion etching, Semiconducting wafers, Stochastic processes, Bayesian inference

Proceedings Article | 3 October 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Reticles, Metrology, Image processing, Scanners, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 4 April 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Overlay metrology, Error analysis, Optical lithography, Metals, Composites, Semiconducting wafers, Received signal strength, Semiconductors, Control systems, Double patterning technology

SPIE Journal Paper | 24 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

Proceedings Article | 30 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Cadmium, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

Showing 5 of 36 publications
Conference Committee Involvement (4)
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
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