Amir Lev
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Metrology, Statistical analysis, Scanners, Error analysis, Time metrology, Process control, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Metrology, Etching, Manufacturing, Adaptive optics, Process control, Critical dimension metrology, Semiconducting wafers, Process modeling, Information operations

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