Andre Engelen
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86830P (2013) https://doi.org/10.1117/12.2011507
KEYWORDS: Overlay metrology, Metrology, Scanners, Sensors, Semiconducting wafers, Yield improvement, Signal processing, Scatterometry, Control systems, Wafer manufacturing

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76400Y (2010) https://doi.org/10.1117/12.846703
KEYWORDS: Scanners, Critical dimension metrology, Shape analysis, Optical proximity correction, Fiber optic illuminators, Semiconducting wafers, Lithography, Control systems, Instrument modeling, Process control

Proceedings Article | 4 March 2010 Paper
Jörg Zimmermann, Paul Gräupner, Jens Neumann, Dirk Hellweg, Dirk Jürgens, Michael Patra, Christoph Hennerkes, Manfred Maul, Bernd Geh, Andre Engelen, Oscar Noordman, Melchior Mulder, Sean Park, Joep De Vocht
Proceedings Volume 7640, 764005 (2010) https://doi.org/10.1117/12.847282
KEYWORDS: Diffractive optical elements, Fiber optic illuminators, Reticles, Lithographic illumination, Mirrors, Critical dimension metrology, Distortion, Source mask optimization, Manufacturing, Semiconducting wafers

Proceedings Article | 4 March 2010 Paper
Melchior Mulder, André Engelen, Oscar Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, Jef Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, Joerg Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, Greg McIntyre
Proceedings Volume 7640, 76401P (2010) https://doi.org/10.1117/12.845984
KEYWORDS: Mirrors, Diffractive optical elements, Fiber optic illuminators, Source mask optimization, Imaging systems, Electroluminescence, Polarization, Semiconducting wafers, Photomasks, Light

Proceedings Article | 11 December 2009 Paper
Melchior Mulder, André Engelen, Oscar Noordman, Robert Kazinczi, Gert Streutker, Bert van Drieenhuizen, Stephen Hsu, Keith Gronlund, Markus Degünther, Dirk Jürgens, Johannes Eisenmenger, Michael Patra, Andras Major
Proceedings Volume 7520, 75200Y (2009) https://doi.org/10.1117/12.837035
KEYWORDS: Mirrors, Fiber optic illuminators, Diffractive optical elements, Source mask optimization, Micromirrors, Light, Metrology, Semiconducting wafers, Switching, Scanners

Showing 5 of 21 publications
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