Single layers and high reflecting QWOT stacks for 1064 nm of Al2O3, HfO2, SiO2, Ta2O5, TiO2, and ZrO2 were deposited on polished BK7 and fused silica substrates. All materials were evaporated with a conventional electron beam evaporator. The growing film surface was bombarded with ions from a microwave excited ECR ion source. Refractive indices were determined by spectrophotometric analysis of single layers. Laser calorimetry was used to measure absorption of light. Investigations on laser induced damage were performed by damage frequency measurements. Damage frequencies were based on more than 500 single tests per sample, ('one on one' method). From this data a certain value of damage threshold in accordance with ISO/DIS 11254 could be obtained. All results were compared with the corresponding values of conventional produced coatings.
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