Andreas Torsy
at Altis Semiconductor
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Reticles, Data modeling, Manufacturing, Software development, Microelectronics, Photomasks, Semiconducting wafers, Standards development

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reticles, Contamination, Particles, Crystals, Ions, Photomasks, Chemical analysis, Analytical research, Semiconducting wafers, Standards development

Proceedings Article | 20 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Scanners, Manufacturing, Scanning electron microscopy, Relays, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Data modeling, Visualization, Calibration, Silicon, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design, Process modeling

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