Andreia Santos
Senior Photolithography Process Engineer at Screen SPE
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 March 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Medium wave, Photoresist processing

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11612, Advances in Patterning Materials and Processes XXXVIII
KEYWORDS: Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist developing

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11612, Advances in Patterning Materials and Processes XXXVIII
KEYWORDS: Lithography, Polymers, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Stochastic processes

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Fluorine, Semiconducting wafers

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