Dr. Andrew J. Dallas Profile

Dr. Andrew J. Dallas

Senior Principal Scientist at Donaldson Co Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 2 April 2010 Paper

AMC control in photolithography: the past decade in review

Gerald Weineck, Dustin Zastera, Andrew Dallas

Proceedings Volume 7638, 76383H (2010) https://doi.org/10.1117/12.847258

KEYWORDS: Contamination, Industrial chemicals, Deep ultraviolet, Gases, Carbon, Optical lithography, Head-mounted displays, Natural surfaces, Silicon, Chemistry

Read Abstract +

Proceedings Article | 24 March 2009 Paper

An investigation of perfluoroalkylamine contamination control

Andrew Dallas, Dustin Zastera

Proceedings Volume 7272, 727220 (2009) https://doi.org/10.1117/12.814851

KEYWORDS: Carbon, Contamination, Optical lithography, Sensors, Adsorption, Contamination control, Lithography, Humidity, Nitrogen, Semiconductors

Read Abstract +

Proceedings Article | 24 March 2008 Paper

Rationalizing the mechanism of HMDS degradation in air and effective control of the reaction byproducts

Kevin Seguin, Andrew Dallas, Gerald Weineck

Proceedings Volume 6922, 692230 (2008) https://doi.org/10.1117/12.772998

KEYWORDS: Head-mounted displays, Carbon, FT-IR spectroscopy, Humidity, Contamination, Adsorption, Calibration, Semiconducting wafers, Lithography, Absorbance

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Low-pressure drop filtration of airborne molecular organic contaminants using open-channel networks

Andrew Dallas, Jon Joriman, Lefei Ding, Gerald Weineck, Kevin Seguin

Proceedings Volume 6518, 651846 (2007) https://doi.org/10.1117/12.708302

KEYWORDS: Carbon, Silicon, Head-mounted displays, Adsorption, Fluctuations and noise, Chemistry, Contamination, Semiconductor manufacturing, Humidity, Silicon carbide

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Low-pressure drop airborne molecular contaminant filtration using open-channel networks

Andrew Dallas, Lefei Ding, Jon Joriman, Dustin Zastera, Kevin Seguin, James Empson

Proceedings Volume 6152, 61524M (2006) https://doi.org/10.1117/12.661779

KEYWORDS: Fluctuations and noise, Contamination, Semiconductors, Lithography, Chemically amplified resists, Microelectronics, Optical filters, Chemistry, Sulfur, Polymers

Read Abstract +

Proceedings Article | 24 March 2006 Paper

An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)

Andrew Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Kevin Seguin, Dustin Zastera

Proceedings Volume 6152, 61523R (2006) https://doi.org/10.1117/12.654839

KEYWORDS: Adsorption, Carbon, Ions, Statistical analysis, FT-IR spectroscopy, Hydrogen, Natural surfaces, Semiconductors, Ion exchange, Humidity

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Removal of low concentrations of acid gases: issues and solutions

Andrew Dallas, Lefei Ding, Jeremy Exley, Jon Joriman, Brian Hoang, Jonathan Parsons, Kevin Seguin, Dustin Zastera

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599815

KEYWORDS: Gases, Carbon, Humidity, Sensors, Contamination, Lithography, Network architectures, Fluctuations and noise, Ions, Industrial chemicals

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Are ambient SO2 levels a valid indicator of projected acid gas filter life?

Andrew Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Jonathan Parsons, Kevin Seguin

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534102

KEYWORDS: Gases, Chemical analysis, Manufacturing, Carbon, Industrial chemicals, Oxides, Nitrogen, Adsorption, Ions, Sulfur

Read Abstract +

Proceedings Article | 26 June 2003 Paper

New concerns with the design of filters for the protection of lithography optics

Andrew Dallas, William Ding, Brian Hoang, Jon Joriman, Jonathan Parsons, Kevin Seguin

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485416

KEYWORDS: Directed energy weapons, Humidity, Sulfur, Contamination, Optical filters, Sensors, Manufacturing, Adsorption, Semiconducting wafers, Lithography

Read Abstract +

Proceedings Article | 16 July 2002 Paper

Characterization and control of organic airborne contamination in lithographic processing

Andrew Dallas, Kristine Graham, Marc Clarysse, Vic Fonderle

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473438

KEYWORDS: Semiconducting wafers, Chemical analysis, Statistical analysis, Carbon, Contamination, Lithography, Ions, Toxic industrial chemicals, Optical filters, Adsorption

Read Abstract +

Proceedings Article | 2 June 2000 Paper

Protecting the DUV process and optimizing optical transmission

Andrew Dallas, Debbie Arends, Kristen Fischer, Jon Joriman, Kristine Graham, Richard Ringold

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386451

KEYWORDS: Contamination, Carbon, Nitrogen, Transmittance, Optical filters, Deep ultraviolet, Lithography, Semiconducting wafers, Statistical analysis, Gases

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years