Mr. Andrew R. Mikkelson Profile

Andrew R. Mikkelson

Lab Program Manager/Unix Administrator at Univ of Wisconsin-Madison

SPIE Involvement:

Author

Publications (28)

SPIE Journal Paper | 1 October 2009

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for extreme ultraviolet lithography

Michael Sogard, Andrew Mikkelson, Vasu Ramaswamy, Roxann Engelstad

JM3, Vol. 8, Issue 04, 041506, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238518

KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Mounting methodologies to measure EUV reticle nonflatness

Venkata Siva Battula, Jacob Zeuske, Roxann Engelstad, Pradeep Vukkadala, Andrew Mikkelson, Chris Van Peski

Proceedings Volume 7470, 747014 (2009) https://doi.org/10.1117/12.835202

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Interferometry, Photography, Computer aided design, Interferometers, Extreme ultraviolet, Beam expanders, Lithography

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for EUV lithography

Michael Sogard, Andrew Mikkelson, Vasu Ramaswamy, Roxann Engelstad

Proceedings Volume 7271, 72710H (2009) https://doi.org/10.1117/12.815402

KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

Read Abstract +

Proceedings Article | 2 May 2008 Paper

Status of EUVL reticle chucking

Roxann Engelstad, Jaewoong Sohn, Jacob Zeuske, Venkata Siva Battula, Pradeep Vukkadala, Chris Van Peski, Kevin Orvek, Kevin Turner, Andrew Mikkelson, Madhura Nataraju

Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Roxann Engelstad, Kevin Turner, Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Venkata Siva Battula, Pradeep Vukkadala, Jacob Zeuske, Chris Van Peski

Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842

KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

Read Abstract +

Proceedings Article | 24 October 2007 Paper

Compensating for image placement errors induced during the fabrication and chucking of EUVL masks

Roxann Engelstad, Jaewoong Sohn, Andrew Mikkelson, Madhura Nataraju, Kevin Turner

Proceedings Volume 6730, 673004 (2007) https://doi.org/10.1117/12.752601

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Distortion, Electron beam lithography, 3D modeling, Etching, Interferometry, Surface finishing, Thin films

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Predicting and correcting for image placement errors during the fabrication of EUVL masks

R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner

Proceedings Volume 6533, 653314 (2007) https://doi.org/10.1117/12.737181

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Distortion, Reticles, 3D modeling, Etching, Electron beam lithography, Surface finishing, Thin films, Multilayers

Read Abstract +

Proceedings Article | 15 March 2007 Paper

Electrostatic chucking of EUVL reticles

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Roxann Engelstad, Kevin Turner, Chris Van Peski, Kevin Orvek

Proceedings Volume 6517, 65170Y (2007) https://doi.org/10.1117/12.720621

KEYWORDS: Reticles, Extreme ultraviolet lithography, Standards development, Photomasks, Interferometers, Photography, Dielectrics, Finite element methods, Coating, Interferometry

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 634939 (2006) https://doi.org/10.1117/12.686153

KEYWORDS: Reticles, Data modeling, Photomasks, Extreme ultraviolet lithography, Interferometers, Standards development, Finite element methods, Photography, Vibration isolation, Particles

Read Abstract +

Proceedings Article | 21 June 2006 Paper

Characterizing the response of an EUV reticle during electrostatic chucking

Roxann Engelstad, Edward Lovell, Andrew Mikkelson, Madhura Nataraju, Vasu Ramaswamy, Jaewoong Sohn, Gerald Dicks, Amr Abdo, Richard Tejeda

Proceedings Volume 6281, 628107 (2006) https://doi.org/10.1117/12.692727

KEYWORDS: Reticles, Particles, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Data modeling, Zerodur, Glasses, 3D modeling, Thermal modeling

Read Abstract +

Proceedings Article | 22 March 2006 Paper

EUV mask and chuck analysis: simulation and experimentation

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6151, 61510C (2006) https://doi.org/10.1117/12.657154

KEYWORDS: Photomasks, Extreme ultraviolet, Data modeling, Focus stacking software, Lithography, Semiconductors, Extreme ultraviolet lithography, Standards development, Interferometers, Contamination

Read Abstract +

Proceedings Article | 8 November 2005 Paper

Predicting wafer-level IP error due to particle-induced EUVL reticle distortion during exposure chucking

Vasu Ramaswamy, Andrew Mikkelson, Roxann Engelstad, Edward Lovell

Proceedings Volume 5992, 59923T (2005) https://doi.org/10.1117/12.631362

KEYWORDS: Reticles, Particles, Distortion, Extreme ultraviolet lithography, Particle contamination, Semiconducting wafers, Photomasks, Finite element methods, Error analysis, Glasses

Read Abstract +

Proceedings Article | 8 November 2005 Paper

Electrostatic chucking and EUVL mask flatness analysis

M. Nataraju, A. Mikkelson, J. Sohn, R. Engelstad, E. Lovell

Proceedings Volume 5992, 59923S (2005) https://doi.org/10.1117/12.631361

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Data modeling, Standards development, Image quality, Control systems, Error analysis, Analytical research, Lithography

Read Abstract +

Proceedings Article | 6 December 2004 Paper

The influence of an electrostatic pin chuck on EUV mask flatness

Gerald Dicks, Andrew Mikkelson, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569034

KEYWORDS: Photomasks, Extreme ultraviolet, Dielectrics, 3D modeling, Optical lithography, Reticles, Extreme ultraviolet lithography, Electrodes, Capacitance, Interferometry

Read Abstract +

Proceedings Article | 2 June 2004 Paper

Effect of electrostatic chucking on EUVL mask flatness

Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Lutz Aschke, Frauke Rueggeberg, Frank Sobel

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568014

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Polishing, Multilayers, Surface finishing, Data modeling, Finite element methods, Standards development, Mask making, Semiconductors

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Modeling LEEPL mask fabrication processes

Xabier Azkorra, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Jaehyuk Chang, Jaewoong Sohn, Madhura Nataraju, Hideyuki Eguchi

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546927

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electrodes, Mask making, Silicon, 3D modeling, Printing, Lithography, Device simulation

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Optimization of EUVL reticle thickness for image placement accuracy

Liang Zheng, Andrew Mikkelson, Amr Abdo, Roxann Engelstad, Edward Lovell, Thomas White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518062

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Device simulation, Mask making, Glasses, Metrology, Polishing, Solids

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Strategies for predictive control of chrome stress-induced registration errors

Alexander Wei, Gregory Hughes, Aaron Chalekian, Lawrence Mackey, Andrew Mikkelson, Roxann Engelstad

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485496

KEYWORDS: Photomasks, Image registration, Etching, Distortion, Optical lithography, Reticles, Yield improvement, Manufacturing, Chemical elements, Finite element methods

Read Abstract +

Proceedings Article | 16 June 2003 Paper

EUV mask stress mapping by an experimental and hybrid finite element technique

Zhaohua Feng, Edward Lovell, Roxann Engelstad, Andrew Mikkelson, Phillip Reu, Jaewoong Sohn, Kenneth Blaedel, Andre Claudet

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490139

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Reticles, Reflectors, Lithography, Distortion, Extreme ultraviolet lithography, Chromium, Spherical lenses

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Mechanical modeling of the reticle and chuck for EUV lithography

Carl Martin, Andrew Mikkelson, Richard Tejeda, Roxann Engelstad, Edward Lovell, Kenneth Blaedel, Andre Claudet

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472290

KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Reflectivity, Multilayers, Glasses, Finite element methods, Semiconducting wafers

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Andrew Mikkelson, Amr Abdo, Eric Cotte, Jaewoong Sohn, Roxann Engelstad, Edward Lovell

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458256

KEYWORDS: Reticles, Pellicles, Electron beam lithography, Photomasks, Silica, Lithography, Device simulation, 3D modeling, Chromium, Mechanics

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Mechanical analysis of hard pellicles for 157-nm lithography

Phillip Reu, Andrew Mikkelson, Michael Schlax, Eric Cotte, Lowell Siewert, Roxann Engelstad, Edward Lovell, Giang Dao, Jun-Fei Zheng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435651

KEYWORDS: Pellicles, Reticles, Lithography, Aluminum, Velocity measurements, Finite element methods, Silica, Optical components, Adhesives, Modal analysis

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Vibrational analysis of 200-mm EPL masks

Andrew Mikkelson, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436698

KEYWORDS: Photomasks, Mask cleaning, Charged-particle lithography, Metrology, Inspection, Shape analysis, 3D modeling, Performance modeling, Silicon, Aluminum

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Pellicle-induced distortions in advanced optical reticles

William Semke, Lowell Siewert, Andrew Mikkelson, Eric Risius, Ning Tang, Roxann Engelstad, Edward Lovell, Jun-Fei Zheng, Giang Dao

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410695

KEYWORDS: Pellicles, Reticles, Photomasks, Adhesives, Analytical research, Lithography, Sensors, Aluminum, Error analysis, Finite element methods

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Influence of film stress on advanced optical reticle distortions

Lowell Siewert, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Mark Mason, R. Mackay

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389008

KEYWORDS: Reticles, Etching, Thin films, Photomasks, Metrology, Optical lithography, Optical alignment, Chromium, Chemical elements, Mask making

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Mechanical distortions in advanced optical reticles

Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Theodore Bloomstein, Mark Mason

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351143

KEYWORDS: Photomasks, Chromium, Silica, Reticles, Magnesium fluoride, Mask making, Device simulation, Etching, Electron beam lithography, Transmittance

Read Abstract +