Dr. Andrew J. Moore Profile

Dr. Andrew J. Moore

at Luminescent Technologies Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 26 March 2007 Paper

SRAF placement and sizing using inverse lithography technology

Timothy Lin, Frederic Robert, Amandine Borjon, Gordon Russell, Catherine Martinelli, Andrew Moore, Yves Rody

Proceedings Volume 6520, 65202A (2007) https://doi.org/10.1117/12.712369

KEYWORDS: SRAF, Photomasks, Manufacturing, Image quality, Lithography, Diffractive optical elements, Computer simulations, Lithographic illumination, Printing, Optical lithography

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Proceedings Article | 20 October 2006 Paper

Inverse lithography technology at low k1: placement and accuracy of assist features

Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, Daniel Abrams

Proceedings Volume 6349, 63494T (2006) https://doi.org/10.1117/12.693039

KEYWORDS: Photomasks, SRAF, Lithography, Semiconductors, Manufacturing, Computer simulations, Phase shifts, Tolerancing, Resolution enhancement technologies, Chemical elements

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Proceedings Article | 20 March 2006 Paper

Enhancing DRAM printing process window by using inverse lithography technology (ILT)

Chih-Wei Chu, Becky Tsao, Karl Chiou, Snow Lee, Jerry Huang, Yong Liu, Timothy Lin, Andrew Moore, Linyong Pang

Proceedings Volume 6154, 61543O (2006) https://doi.org/10.1117/12.657015

KEYWORDS: Photomasks, Lithography, Image quality, Semiconductors, Semiconducting wafers, Printing, Scanning electron microscopy, Light sources, Quality measurement, Manufacturing

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Proceedings Article | 8 November 2005 Paper

Inverse lithography technology principles in practice: unintuitive patterns

Yong Liu, Dan Abrams, Linyong Pang, Andrew Moore

Proceedings Volume 5992, 599231 (2005) https://doi.org/10.1117/12.632366

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Image segmentation, Image quality, Resolution enhancement technologies, Manufacturing, Semiconductors, Printing, Inverse optics

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Proceedings Article | 8 November 2005 Paper

Inverse lithography technology: verification of SRAM cell pattern

Artur Balasinski, Andrew Moore, Nader Shamma, Timothy Lin, Hee-hong Yang

Proceedings Volume 5992, 599230 (2005) https://doi.org/10.1117/12.632344

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Silicon, Calibration, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Optical inspection, Reticles

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Proceedings Article | 5 November 2005 Paper

First 65nm tape-out using inverse lithography technology (ILT)

Chi-Yuan Hung, Bin Zhang, Deming Tang, Eric Guo, Linyong Pang, Yong Liu, Andrew Moore, Kechang Wang

Proceedings Volume 5992, 59921U (2005) https://doi.org/10.1117/12.632415

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Vestigial sideband modulation, Inspection, Wafer-level optics, Calibration, Manufacturing, Image segmentation

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Showing 5 of 6 publications

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