Prof. Andrew R. Neureuther
Professor Emeritus at Univ of California Berkeley
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (212)

Proceedings Article | 23 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Multilayers, Image processing, Light scattering, Constructive interference, Printing, Reflectometry, Image quality, Extreme ultraviolet, Destructive interference, Phase shifts

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Electron beams, Metrology, 3D modeling, Extreme ultraviolet, Line width roughness, Image denoising, Line edge roughness, Photomicroscopy, Stochastic processes, Eye models

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Lithography, Deep ultraviolet, Electrons, Interfaces, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Self-assembled monolayers, New and emerging technologies

SPIE Journal Paper | 27 August 2020
JM3 Vol. 19 Issue 03

Proceedings Article | 8 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Chemical species, Metals, Molecules, Quantum efficiency, Chemistry, Ionization, Extreme ultraviolet, Photochemistry, Tin, Absorption