Mr. Andrew Pomerene Profile

Andrew Pomerene

Manager at BAE Systems

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Author

Publications (8)

Proceedings Article | 16 February 2012 Paper

Shared shuttles for integrated silicon optoelectronics

Tom Baehr-Jones, Ran Ding, Ali Ayazi, Thierry Pinguet, Matt Streshinsky, Nick Harris, Jing Li, Li He, Mike Gould, Yi Zhang, Andy Eu-Jin Lim, Tsung-Yang Liow, Selin Hwee-Gee Teo, Guo-Qiang Lo, Stewart Ocheltree, Craig Hill, Andrew Pomerene, Peter De Dobbelaere, Attila Mekis, Michael Hochberg

Proceedings Volume 8252, 82520G (2012) https://doi.org/10.1117/12.913096

KEYWORDS: Silicon, Modulators, Optoelectronics, Silicon photonics, Waveguides, Semiconducting wafers, Standards development, Sensors, Electronics, Germanium

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Proceedings Article | 13 February 2008 Paper

Optical modulation techniques for analog signal processing and CMOS compatible electro-optic modulation

Douglas Gill, Mahmoud Rasras, Kun-Yii Tu, Young-Kai Chen, Alice White, Sanjay Patel, Daniel Carothers, Andrew Pomerene, Robert Kamocsai, James Beattie, Anthony Kopa, Alyssa Apsel, Mark Beals, Jurgen Mitchel, Jifeng Liu, Lionel Kimerling

Proceedings Volume 6898, 689803 (2008) https://doi.org/10.1117/12.777113

KEYWORDS: Modulators, Modulation, Resonators, Silicon, Waveguides, Analog electronics, Electro optics, Signal processing, Electrooptic modulators, Polarization

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Proceedings Article | 13 February 2008 Paper

Process flow innovations for photonic device integration in CMOS

Mark Beals, J. Michel, J. Liu, D. Ahn, D. Sparacin, R. Sun, C. Y. Hong, L. Kimerling, A. Pomerene, D. Carothers, J. Beattie, A. Kopa, A. Apsel, M. Rasras, D. Gill, S. Patel, K. Y. Tu, Y. Chen, A. White

Proceedings Volume 6898, 689804 (2008) https://doi.org/10.1117/12.774576

KEYWORDS: Silicon, Waveguides, Germanium, Oxides, Modulators, Photonic devices, Sensors, Silicon films, Plasma enhanced chemical vapor deposition, Signal processing

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Proceedings Article | 9 February 2007 Paper

Advances in fully CMOS integrated photonic devices

Jurgen Michel, J. Liu, D. Ahn, D. Sparacin, R. Sun, C. Hong, W. Giziewicz, M. Beals, L. Kimerling, A. Kopa, A. Apsel, M. Rasras, D. Gill, S. Patel, K. Tu, Y. Chen, A. White, A. Pomerene, D. Carothers, M. Grove

Proceedings Volume 6477, 64770P (2007) https://doi.org/10.1117/12.706586

KEYWORDS: Waveguides, Sensors, Silicon, Modulators, Optical filters, Resonators, Photodetectors, Microwave radiation, Signal processing, Semiconducting wafers

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Proceedings Article | 1 March 2006 Paper

Electronic-photonic integrated circuits on the CMOS platform

L. Kimerling, D. Ahn, A. Apsel, M. Beals, D. Carothers, Y.-K. Chen, T. Conway, D. Gill, M. Grove, C.-Y. Hong, M. Lipson, J. Liu, J. Michel, D. Pan, S. Patel, A. Pomerene, M. Rasras, D. Sparacin, K.-Y. Tu, A. White, C. Wong

Proceedings Volume 6125, 612502 (2006) https://doi.org/10.1117/12.654455

KEYWORDS: Waveguides, Silicon, Sensors, Modulators, Signal processing, Photodetectors, Optical filters, Signal attenuation, Germanium, Integrated circuits

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Proceedings Article | 13 May 1994 Paper

Optimization of ESCAP photoresist for x-ray lithography

Andrew Pomerene, Karen Petrillo, David Seeger, Hiroshi Ito, Gregory Breyta, Donald Hofer

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175801

KEYWORDS: Semiconducting wafers, Photoresist materials, X-rays, X-ray lithography, Synchrotrons, Deep ultraviolet, Lithography, Critical dimension metrology, Etching, X-ray sources

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Proceedings Article | 13 May 1994 Paper

Supporting early development of advanced high-performance logic with synchrotron orbital radiation lithography: a feasibility evaluation

Lars Liebmann, Andrew Pomerene, Daniel DeMay, Angela Lamberti, Thomas Donohue, Joachim Burghartz

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175816

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Logic, Manufacturing, Synchrotrons, Reactive ion etching, Etching, Image quality, Metrology

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Proceedings Article | 24 June 1993 Paper

Photoresist process latitude optimization for synchrotron x-ray lithography

Andrew Pomerene, David Seeger, Patricia Blauner

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146495

KEYWORDS: Semiconducting wafers, X-rays, Transmission electron microscopy, Photomasks, Critical dimension metrology, Synchrotrons, Thermography, Photoresist materials, X-ray lithography, Scanning electron microscopy

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Showing 5 of 8 publications

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