Dr. Andrey A. Lutich Profile

Dr. Andrey A. Lutich

Data Scientist at Sachcontrol GmbH

SPIE Involvement:

Author

Publications (16)

SPIE Journal Paper | 6 March 2018

Introducing etch kernels for efficient pattern sampling and etch bias prediction

François Weisbuch, Andrey Lutich, Jirka Schatz

JM3, Vol. 17, Issue 01, 013505, (March 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013505

KEYWORDS: Etching, Scanning electron microscopy, Data modeling, Optical proximity correction, Optical lithography, Performance modeling, Calibration, Anisotropic etching, Artificial neural networks, 3D modeling

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Proceedings Article | 28 September 2017 Paper

Contour-based etch modeling enablement: from pattern selection to final verification

Jirka Schatz, François Weisbuch, Andrey Lutich

Proceedings Volume 10446, 104460M (2017) https://doi.org/10.1117/12.2279694

KEYWORDS: Etching, Scanning electron microscopy, Performance modeling, Optical proximity correction, Metrology, Data modeling, Image processing, Resolution enhancement technologies, Buildings, Calibration

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Proceedings Article | 28 September 2017 Paper

Pattern sampling for etch model calibration

François Weisbuch, Andrey Lutich, Jirka Schatz

Proceedings Volume 10446, 1044610 (2017) https://doi.org/10.1117/12.2279700

KEYWORDS: Etching, Calibration, Optical lithography, Distance measurement, Scanning electron microscopy, Optical proximity correction, Physics, Photoresist materials, Anisotropic etching

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SPIE Journal Paper | 19 September 2017

PatterNet: a system to learn compact physical design pattern representations for pattern-based analytics

Andrey Lutich

JM3, Vol. 16, Issue 03, 034505, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.034505

KEYWORDS: Computer aided design, Analytics, Neural networks, Semiconductors, Optical lithography, Machine learning, Network architectures, Neurons, Artificial neural networks, Evolutionary algorithms

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Proceedings Article | 30 March 2017 Paper

Design space analysis of novel interconnect constructs for 22nm FDX technology

Tuhin Guha Neogi, Navneet Jain, Piyush Verma, David Permana, Andrey Lutich, Francois Weishbuch, Deepal Wehella-Gamage, Benoit Francois Claude Ramadout, Gowtham Vangara, Juhan Kim, Thomas Herrmann, Kai Sun, Katherina Babich, David Pritchard, Mahbub Rashed

Proceedings Volume 10148, 101480Z (2017) https://doi.org/10.1117/12.2258668

KEYWORDS: Monte Carlo methods, Diffusion, Statistical analysis, Lithography, Manufacturing, Diffractive optical elements, Optical lithography, Design for manufacturability, Silicon, Shape analysis

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Proceedings Article | 28 March 2017 Presentation + Paper

Design space sampling using hierarchical clustering of patterns on a full chip

Andrey Lutich

Proceedings Volume 10148, 101480T (2017) https://doi.org/10.1117/12.2257988

KEYWORDS: Feature extraction, Optical proximity correction, Manufacturing, Semiconductor manufacturing, Algorithm development, Optimization (mathematics), Machine learning, Lithography, Etching, Image processing, Failure analysis, Databases

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Proceedings Article | 24 March 2017 Paper

Optimal structure sampling for etch model calibration

François Weisbuch, Andrey Lutich, Jirka Schatz

Proceedings Volume 10147, 101470I (2017) https://doi.org/10.1117/12.2257994

KEYWORDS: Etching, Data modeling, Calibration, Optical proximity correction, Lithography, Photoresist materials, Physics, Scanning electron microscopy, Optical lithography, Computational lithography, Performance modeling, Anisotropic etching, Distance measurement

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Proceedings Article | 20 October 2016 Paper

SRAF insertion for VIA-like layers using laSRAF method

Andrey Lutich

Proceedings Volume 10032, 100320K (2016) https://doi.org/10.1117/12.2248015

KEYWORDS: SRAF, Optical proximity correction, Model-based design, Resolution enhancement technologies, Superposition, Photomasks, Detection and tracking algorithms, Performance modeling, Fiber optic illuminators, Lithography

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Proceedings Article | 20 October 2016 Paper

Improving contact layer patterning using SEM contour based etch model

François Weisbuch, Andrey Lutich, Jirka Schatz, Tino Hertzsch, Hans-Peter Moll

Proceedings Volume 10032, 1003202 (2016) https://doi.org/10.1117/12.2248013

KEYWORDS: Scanning electron microscopy, Etching, Optical lithography, Calibration, Optical proximity correction, Data modeling, Lithography, Metrology, Photomasks, Semiconducting wafers

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Proceedings Article | 16 March 2016 Paper

Hybrid pattern matching based SRAF placement

Ahmed Omran, Andrey Lutich, Uwe Paul Schroeder

Proceedings Volume 9781, 978117 (2016) https://doi.org/10.1117/12.2225830

KEYWORDS: SRAF, Logic, Design for manufacturing, Optical proximity correction, Immersion lithography, Model-based design, Performance modeling, Photomasks, Databases, Lithography, Printing, Photovoltaics, Resolution enhancement technologies, Phase modulation

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Proceedings Article | 18 March 2015 Paper

Alternative to ILT method for high-quality full-chip SRAF insertion

Andrey Lutich

Proceedings Volume 9426, 94260U (2015) https://doi.org/10.1117/12.2085724

KEYWORDS: SRAF, Electroluminescence, Optical proximity correction, Photomasks, Lithography, Optical lithography, Model-based design, Image compression, Optics manufacturing, Resolution enhancement technologies

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Proceedings Article | 31 March 2014 Paper

A stochastic approach to SRAF printing prediction

Andrey Lutich

Proceedings Volume 9052, 905225 (2014) https://doi.org/10.1117/12.2045897

KEYWORDS: SRAF, Printing, Stochastic processes, Calibration, Image processing, Photomasks, Palladium, Semiconducting wafers, Reticles, Optical proximity correction

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Proceedings Article | 17 June 2009 Paper

Nanoporous alumina films for display devices

Vitaly Sokol, Sergey Gaponenko, Valentina Yakovtseva, George Litvinovich, Sergey Prislopsky, Andrey Lutich

Proceedings Volume 7377, 73770R (2009) https://doi.org/10.1117/12.836976

KEYWORDS: Light scattering, LCDs, Birefringence, Polarization, Aluminum, Sensors, Light emitting diodes, Scattering, Refractive index, Refraction

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Proceedings Article | 31 July 2007 Paper

Form-birefringence simulation: different approaches comparison

Andrey Lutich

Proceedings Volume 6728, 67283H (2007) https://doi.org/10.1117/12.752474

KEYWORDS: Refractive index, Birefringence, Dispersion, Photonic crystals, Nanostructures, Magnesium, Dielectric polarization, Dielectrics, Atomic, molecular, and optical physics, Silicon

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Proceedings Article | 4 May 2007 Paper

Birefringence of nanoporous alumina: experiment vs. theory

A. Lutich, M. Danailov, S. Volchek, V. A. Yakovtseva, V. A. Sokol, S. Gaponenko

Proceedings Volume 6581, 65810T (2007) https://doi.org/10.1117/12.722868

KEYWORDS: Birefringence, Refractive index, Data modeling, Polarization, Silicon, Aluminum, Statistical analysis, Polarizers, Solids, Etching

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Proceedings Article | 9 June 2006 Paper

Scattering, propagation, and polarization changes of light in nanoporous anodic alumina

Andrey Lutich, Igor Molchan, Nicolai Gaponenko, Sergey Gaponenko

Proceedings Volume 6258, 62580J (2006) https://doi.org/10.1117/12.677122

KEYWORDS: Light scattering, Scattering, Polarization, Birefringence, Laser scattering, Photonic crystals, Raman scattering, Solids, Electromagnetic scattering, Refractive index

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Showing 5 of 16 publications

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