CONFERENCE PROCEEDINGS
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Andrzej Panas
at Institute of Microelectronics and Photonics
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Publications (4)
Proceedings Article | 14 May 2019 Paper
Superconducting single-photon detectors as smart sensors
W. Słysz, M. Guziewicz, R. Kruszka, A. Klimov, M. Węgrzecki, J. Bar, A. Panas
Proceedings Volume 11054, 110540F (2019) https://doi.org/10.1117/12.2525536
KEYWORDS: Photons, Field effect transistors, Superconductors, Sensors, Cryogenics, Statistical analysis, Single photon detectors, Smart sensors, Quantum efficiency, Photodetectors
Proceedings Article | 22 December 2016 Paper
16-element photodiode array for the angular microdeflection detector and for stabilization of a laser radiation direction
Maciej Węgrzecki, Tadeusz Piotrowski, Jan Bar, Rafał Dobrowolski, Andrii Klimov, Helena Klos, Michał Marchewka, Marek Nieprzecki, Andrzej Panas, Piotr Prokaryn, Bartłomiej Seredyński, Andrzej Sierakowski, Wojciech Słysz, Dariusz Szmigiel, Michal Zaborowski
Proceedings Volume 10175, 101750Z (2016) https://doi.org/10.1117/12.2257558
KEYWORDS: Photodiodes, Laser stabilization, Sensors, Photovoltaics, Photomasks, Aluminum, Laser applications, Laser metrology, Laser development, Photography
Proceedings Article | 22 December 2016 Paper
New silicon photodiodes for detection of the 1064nm wavelength radiation
Maciej Węgrzecki, Tadeusz Piotrowski, Zbigniew Puzewicz, Jan Bar, Ryszard Czarnota, Rafal Dobrowolski, Andrii Klimov, Jan Kulawik, Helena Kłos, Michał Marchewka, Marek Nieprzecki, Andrzej Panas, Bartłomiej Seredyński, Andrzej Sierakowski, Wojciech Słysz, Beata Synkiewicz, Dariusz Szmigiel, Michał Zaborowski
Proceedings Volume 10175, 101750Y (2016) https://doi.org/10.1117/12.2257557
KEYWORDS: Photodiodes, Silicon, Photomasks, Aluminum, Photons, Mirrors, Reflectivity, Image segmentation, Diffusion, Optical lithography
Proceedings Article | 10 November 2016 Paper
Functionalization of MEMS cantilever beams for interconnect reliability investigation: development practice
T. Bieniek, G. Janczyk, R. Dobrowolski, K. Wojciechowska, A. Malinowska, A. Panas, M. Nieprzecki, H. Kłos
Proceedings Volume 10161, 1016103 (2016) https://doi.org/10.1117/12.2244299
KEYWORDS: Microelectromechanical systems, Reliability, Metals, Silicon, 3D modeling, Optimization (mathematics), Plasma etching, Semiconducting wafers, Lead, Device simulation
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