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Anett Heinrich
at NaMLab gGmbH
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Publications (3)
Proceedings Article | 17 October 2014 Paper
Photomask CD and LER characterization using Mueller matrix spectroscopic ellipsometry
A. Heinrich, I. Dirnstorfer, J. Bischoff, K. Meiner, H. Ketelsen, U. Richter, T. Mikolajick
Proceedings Volume 9231, 92310L (2014) https://doi.org/10.1117/12.2065670
KEYWORDS: Line edge roughness, Critical dimension metrology, Photomasks, Spectroscopic ellipsometry, Error analysis, Statistical analysis, Chemical elements, Scanning electron microscopy, Ellipsometry, Line width roughness
Proceedings Article | 1 October 2013 Paper
Application of Mueller matrix spectroscopic ellipsometry to determine line edge roughness on photomasks
A. Heinrich, I. Dirnstorfer, J. Bischoff, U. Richter, H. Ketelson, K. Meiner, T. Mikolajick
Proceedings Volume 8886, 88860L (2013) https://doi.org/10.1117/12.2030627
KEYWORDS: Line edge roughness, Photomasks, Critical dimension metrology, Spectroscopic ellipsometry, Ellipsometry, Polarization, Metrology, Scanning electron microscopy, Modulation, Computer simulations
Proceedings Article | 9 September 2013 Paper
Sensitivity analysis for OMOG and EUV photomasks characterized by UV-NIR spectroscopic ellipsometry
A. Heinrich, I. Dirnstorfer, J. Bischoff, K. Meiner, U. Richter, T. Mikolajick
Proceedings Volume 8880, 88801V (2013) https://doi.org/10.1117/12.2026157
KEYWORDS: Extreme ultraviolet, Photomasks, Critical dimension metrology, Glasses, Diffraction, Spectroscopic ellipsometry, Silica, Polarization, Multilayers, Data modeling
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