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Anil Gunay Demirkol
at imec
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Publications (1)
Proceedings Article | 24 March 2016 Paper
Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Anil Gunay-Demirkol, Efrain Altamirano Sanchez, Stephane Heraud, Stephane Godny, Anne-Laure Charley, Philippe Leray, Ronen Urenski, Oded Cohen, Igor Turovets, Shay Wolfling
Proceedings Volume 9778, 977807 (2016) https://doi.org/10.1117/12.2220287
KEYWORDS: Semiconducting wafers, Scatterometry, Etching, Critical dimension metrology, Diffractive optical elements, Metrology, Optical lithography, Scatter measurement, Process control, Lithography
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