Anja Rosenbusch
Marketing Manager
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Defect detection, Scattering, Light scattering, Inspection, Solids, Photomasks, Image enhancement, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Defect detection, Inspection, Printing, Photomasks, Image enhancement, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Phase shifting, Inspection, System identification, Photomasks, Mask making, Heads up displays

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithium, Imaging systems, Inspection, Optical proximity correction, Heads up displays, Airborne remote sensing

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Reticles, Optical lithography, Inspection, Printing, Image quality, Detector development, Photomasks, Image enhancement, Optical proximity correction, Semiconducting wafers

Showing 5 of 31 publications
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