Dr. Anja Voigt Profile

Dr. Anja Voigt

Product Manager Negative Photoresists at micro resist technology GmbH

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Author

Publications (8)

Proceedings Article | 21 March 2016 Paper

mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning

Stefan Pfirrmann, Robert Kirchner, Olga Lohse, Vitaliy Guzenko, Anja Voigt, Irina Harder, Anett Kolander, Helmut Schift, Gabi Grützner

Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII

KEYWORDS: Electron beams, Dry etching, Polymers, Scanning electron microscopy, Reactive ion etching, Plasma

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Proceedings Article | 27 March 2014 Paper

Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications

Anja Voigt, Gisela Ahrens, Marina Heinrich, Andrew Thompson, Gabi Gruetzner

Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI

KEYWORDS: Optical lithography, Silica, Glasses, Copper, Nickel, Silicon, Epoxies, Head-mounted displays, Photoresist processing, Electroplating

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Proceedings Article | 27 March 2014 Paper

Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework

Anja Voigt, Rainer Engelke, Gisela Ahrens, Franziska Bullerjahn, Arne Schleunitz, Jan Klein, Gabi Grützner

Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI

KEYWORDS: Etching, Dry etching, Polymers, Nickel, Silicon, Gases, Oxygen, Plasma etching, Nanoimprint lithography, Plasma

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Proceedings Article | 1 September 2011 Paper

Opto-thermal actuation in double layer polymer microcantilevers

C. Martin-Olmos, L. Villanueva, A. Llobera, A. Voigt, G. Gruetzner, G. Abadal, F. Perez-Murano

Proc. SPIE. 8107, Nano-Opto-Mechanical Systems (NOMS)

KEYWORDS: Microelectromechanical systems, Actuators, Polymers, Silicon, Doping, Epoxies, Semiconducting wafers, Signal detection, Polymeric actuators, Absorption

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Proceedings Article | 2 May 2008 Paper

Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist

Anja Voigt, Josef Kouba, Marina Heinrich, Gabi Gruetzner, Heinz-Ulrich Scheunemann, I. Rudolph, Christoph Waberski

Proc. SPIE. 6792, 24th European Mask and Lithography Conference

KEYWORDS: Gold, Carbon, Ultraviolet radiation, X-rays, Photoresist materials, Photomasks, Vitreous, Beryllium, Electroplating, X-ray lithography

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Proceedings Article | 14 May 2004 Paper

Characterization of new ultrathick chemically amplified positive-tone photoresists suitable for electroplating application

Anja Voigt, Marina Heinrich, Gabi Gruetzner

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Microelectromechanical systems, Packaging, Lithography, Polymers, Ultraviolet radiation, Copper, Coating, Photoresist materials, Thin film coatings, Electroplating

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Proceedings Article | 25 June 1999 Paper

Nanometer patterning using ma-N 2400 series DUV negative photoresist and electron beam lithography

Anya Voigt, Harald Elsner, H. Meyer, Gabi Gruetzner

Proc. SPIE. 3676, Emerging Lithographic Technologies III

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Deep ultraviolet, Etching, Ultraviolet radiation, Photoresist materials, Absorbance, Photoresist processing, Picture Archiving and Communication System

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Proceedings Article | 9 June 1995 Paper

Series of AZ-compatible negative photoresists

Anya Voigt, Gabi Gruetzner, E. Sauer, S. Helm, T. Harder, Simone Fehlberg, Juergen Bendig

Proc. SPIE. 2438, Advances in Resist Technology and Processing XII

KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Coating, Resistance, Photoresist materials, Photolysis, Photoresist developing, Absorption

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Showing 5 of 8 publications

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