Dr. Anne-Sophie Morlens
at Ecole Nationale Supérieure de Techniques Avancées
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 October 2007 Paper
Ph. Zeitoun, S. Sebban, J. Goddet, F. Bridou, F. Burgy, B. Cros, D. Douillet, J. Gautier, O. Guillbaud, G. Jamelot, D. Joyeux, S. Kazamias, A. Klisnick, G. Maynard, A. Morlens, D. Phalippou, T. Lefrou, D. Ros, J. Rousseau
Proceedings Volume 6702, 670209 (2007) https://doi.org/10.1117/12.731002
KEYWORDS: X-ray lasers, Wavefronts, Spatial coherence, Spectroscopy, Visibility, Mirrors, Amplifiers, X-rays, Interferometers, Spatial filters

Proceedings Article | 1 October 2007 Paper
J. Gautier, A. Morlens, P. Zeitoun, E. Papalarazou, G. Rey, C. Valentin, J. Goddet, S. Sebban, Guillaume Dovillaire, Xavier Levecq, Samuel Bucourt
Proceedings Volume 6704, 670403 (2007) https://doi.org/10.1117/12.732339
KEYWORDS: Wavefronts, Sensors, Calibration, X-rays, Monochromatic aberrations, Infrared radiation, Extreme ultraviolet, High harmonic generation, Argon, X-ray optics

Proceedings Article | 20 September 2007 Paper
J. Gautier, A. S. Morlens, P. Zeitoun, G. Rey, C. Valentin, E. Papalarazou, J. P. Goddet, S. Sebban, F. Delmotte, M. F. Ravet, F. Bridou
Proceedings Volume 6705, 67050C (2007) https://doi.org/10.1117/12.732424
KEYWORDS: Mirrors, Reflectivity, Holography, Holograms, Multilayers, Silicon, Extreme ultraviolet, Microscopy, Digital holography, X-rays

Proceedings Article | 5 October 2005 Paper
Anne-Sophie Morlens, Marie-Françoise Ravet, Vincent Laude, Rodrigo López-Martens, Marc Roulliay, Arnaud Jérome, Franck Delmotte, Françoise Bridou, Sophie Kazamias, Philippe Balcou, Philippe Zeitoun
Proceedings Volume 5963, 59630W (2005) https://doi.org/10.1117/12.625097
KEYWORDS: Mirrors, Reflectivity, Silicon, Molybdenum, Multilayers, Extreme ultraviolet, Calibration, Reflectometry, Neon, Control systems

Proceedings Article | 6 May 2005 Paper
Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jason Cain, Paul Denham, Brian Hoef, Keith Jackson, Anne-Sophie Morlens, Seno Rekawa, Kim Dean
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600388
KEYWORDS: Printing, Fiber optic illuminators, Line edge roughness, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Reticles, Projection systems, Wafer-level optics

Showing 5 of 6 publications
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