Dr. Anthony E. Novembre Profile

Dr. Anthony E. Novembre

Associate Director at Princeton Univ

SPIE Involvement:

Author

Publications (39)

Proceedings Article | 28 December 2023 Paper

GMC: a negative acting resist used in the fabrication of chromium photomasks

A. Novembre, L. Kowalski, J. Frackoviak, D. Mixon, L. Thompson

Proceedings Volume 12811, 1281108 (2023) https://doi.org/10.1117/12.3011932

KEYWORDS: Photomasks, Etching, Line edge roughness, Film thickness, Process control, Plasma, Fabrication, Dry etching, Chromium, Vacuum chambers

Read Abstract +

Proceedings Article | 24 July 2002 Paper

Fluorinated dissolution inhibitors for 157-nm lithography

Alyssandrea Hamad, Young Bae, Xiang-Qian Liu, Christopher Ober, Francis Houlihan, Gary Dabbagh, Anthony Novembre

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474245

KEYWORDS: Polymers, FT-IR spectroscopy, Absorbance, Photoresist materials, Lithography, Polymethylmethacrylate, Polymer thin films, Distributed interactive simulations, Absorption, Silicon

Read Abstract +

Proceedings Article | 22 January 2001 Paper

UV inspection of EUV and SCALPEL reticles

Donald Pettibone, Noah Bareket, Ted Liang, Alan Stivers, Scott Hector, Pawitter Mangat, Douglas Resnick, Michael Lercel, Mark Lawliss, Christopher Magg, Anthony Novembre, Reginald Farrow

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699

KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Fabrication process and transmission characteristics of SCALPEL mask blanks with thin SiNx membranes

Sang-In Han, Pawitter Mangat, William Dauksher, Michael Chor, James Liddle, Anthony Novembre

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410751

KEYWORDS: Photomasks, Etching, Charged-particle lithography, Silicon, Semiconducting wafers, Refraction, Silicon films, Scattering, Low pressure chemical vapor deposition, Chromium

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure

Leonidas Ocola, Myrtle Blakey, Paul Orphanos, Wai-Yi Li, Anthony Novembre, Robert Brainard, Joseph Mackevich, Gary Taylor

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390055

KEYWORDS: Charged-particle lithography, Deep ultraviolet, Monte Carlo methods, Absorption, Electrons, Polymers, Chemically amplified resists, Lithography, Semiconducting wafers, Scanning electron microscopy

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Etching 200-mm diameter SCALPEL masks with the ASE process

Ian Johnston, Huma Ashraf, Jy Bhardwaj, Janet Hopkins, Alan Hynes, Glenn Nicholls, Serrita McAuley, Stephen Hall, Lilian Atabo, Gregory Bogart, Avi Kornblit, Anthony Novembre

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390054

KEYWORDS: Etching, Semiconducting wafers, Photomasks, Silicon, Charged-particle lithography, Helium, Plasma etching, Wet etching, Plasma, Photoresist materials

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Techniques to inspect SCALPEL masks

Darren Taylor, William Howard, Richard Kasica, Reginald Farrow, Anthony Novembre, Carlos Caminos, Chester Knurek

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373300

KEYWORDS: Charged-particle lithography, Photomasks, Inspection, Lithography, Semiconducting wafers, Calibration, Silicon, Electron beams, Prototyping, Reticles

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Cleaning of SCALPEL next-generation lithography masks using PLASMAX, a revolutionary dry cleaning technology

John Festa, Anthony Novembre, Darryl Bennett, Richard Kasica, Brad Bailey, Myrtle Blakey

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373296

KEYWORDS: Photomasks, Particles, Charged-particle lithography, Semiconducting wafers, Plasma, Silicon, Lithography, Pellicles, Chromium, Mask cleaning

Read Abstract +

Proceedings Article | 30 August 1999 Paper

SCALPEL mask blank fabrication

Thomas Saunders, Myrtle Blakey, Carlos Caminos, Gregory Bogart, Reginald Farrow, Chester Knurek, Avi Kornblit, James Liddle, Anthony Novembre, Milton Peabody

Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361228

KEYWORDS: Photomasks, Etching, Silicon, Charged-particle lithography, Semiconducting wafers, Electron beam lithography, Lithography, Scattering, Crystals, Dry etching

Read Abstract +