Anthony (Tony) Yen is Vice President and Head of the Technology Development Center at ASML, leading a global organization to work on identifying mid- and long-term technological directions in semiconductors and accompanying patterning solutions in close collaboration with other organizations within ASML, imec, and universities. He also teaches as a Professor at National Tsing Hua University. Tony received his BSEE degree from Purdue University and his SM, EE, PhD, and MBA degrees from MIT. From 1991 to 1997, he was a Member of the Technical Staff at Texas Instruments. From 1997 to 2003 and again from 2006 to 2017, he was with TSMC where he led the development of its lithography processes and the development of EUV lithography, including its mask technology, for high-volume manufacturing. Tony has over 100 publications and 150 US patents on nanolithography. He is a Fellow of SPIE and a recipient of its Frits Zernike Award for Microlithography. He is also a recipient of the Outstanding Electrical and Computer Engineer Award from Purdue and co-leads Purdue's Semiconductor Degrees Leadership Board. He serves on the Industrial Advisory Committee of the United States Department of Commerce.