Dr. Anto Yasaka
Director at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 21 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Quartz, Ions, Nitrogen, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Etching, Ions, Silicon, Reflectivity, Image resolution, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Carbon, Etching, Image processing, Ions, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Cadmium sulfide, Semiconducting wafers

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Carbon, Tungsten, Silicon, Chemical vapor deposition, Photomasks, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Vacuum ultraviolet, Gallium

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Carbon, Contamination, Etching, Hydrogen, Chemical vapor deposition, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Cadmium sulfide, Extreme ultraviolet lithography

Showing 5 of 27 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (3)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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