Aram Kazarian
at Synopsys Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Reticles, Optical lithography, Atrial fibrillation, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Mathematical modeling, Lithography, Optical lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photoresist materials, Photomasks, Optical proximity correction

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Etching, Inspection, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Data modeling, Calibration, Diffusion, Image analysis, Optical resolution, Image enhancement, Optical proximity correction, Semiconducting wafers, Chemically amplified resists

Showing 5 of 7 publications
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