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Ariel Broitman
at Nova Ltd
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Publications (1)
Proceedings Article | 20 March 2020 Presentation + Paper
Advanced machine learning eco-system to address HVM optical metrology requirements
Padraig Timoney, Roma Luthra, Alex Elia, Haibo Liu, Paul Isbester, Avi Levy, Michael Shifrin, Barak Bringoltz, Eylon Rabinovich, Ariel Broitman, Eitan Rothstein, Ran Yacoby, Ilya Rubinovich, YongHa Kim, Ofer Shlagman, Barak Ben-Nahum, Marina Zolkin, Igor Turovets
Proceedings Volume 11325, 113251H (2020) https://doi.org/10.1117/12.2552058
KEYWORDS: Metrology, Back end of line, Semiconducting wafers, Scatterometry, Machine learning
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