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Arisa Yamada
at Toshiba Corp
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Author
Publications (1)
Proceedings Article | 26 March 2010 Paper
High resolution positive-working molecular resist attached with alicyclic acid-leaving group
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Lithography, Molecules, Resistance, Scanning electron microscopy, Line width roughness, Oxygen, Quantum efficiency, Photoresist processing, Polymers
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