Molecular resists are expected to offer the advantages of high resolution and low line width roughness (LWR) for the
next-generation lithography. We developed a new molecular resist that showed high resolution by introducing an
efficient acid-leaving group to an amorphous molecule, 1,3,5-Tris(p-(p-hydroxy- phenyl) phenyl) benzene (THTPPB).
The lithographic properties such as sensitivity, developing rate, and adhesion are considered to be controlled using a
suitable acid-leaving group. A molecular resist of THTPPB to which is attached with an alicyclic acid-leaving group,
hyperlactyl vinyl ether group (HPVE) showed a high resolution for electron beam (EB) lithography and good etch resistance. Half-pitch 36 nm line-and-space (1:1) positive pattern was fabricated using 100 keV EB with chemically amplified molecular resist based on HPVETPPB.