Dr. Arjun Singh Profile

Dr. Arjun Singh

Principal Engineer at imec

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Author

Publications (10)

Proceedings Article | 28 March 2016 Paper

Toward sub-20nm pitch Fin patterning and integration with DSA

Safak Sayan, Taisir Marzook, BT Chan, Nadia Vandenbroeck, Arjun Singh, David Laidler, Efrain Sanchez, Philippe Leray, Paulina R. Delgadillo, Roel Gronheid, Geert Vandenberghe, William Clark, Aurelie Juncker

Proceedings Volume 9779, 97790R (2016) https://doi.org/10.1117/12.2220120

KEYWORDS: Directed self assembly, Optical lithography, Optical alignment, Semiconducting wafers, Etching, Photomasks, Image processing, Scanners, Wafer-level optics

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Proceedings Article | 24 March 2016 Paper

Next generation of decision making software for nanopatterns characterization: application to semiconductor industry

A. Dervilllé, A. Labrosse, Y. Zimmermann, J. Foucher, R. Gronheid, C. Boeckx, A. Singh, P. Leray, S. Halder

Proceedings Volume 9778, 977836 (2016) https://doi.org/10.1117/12.2219378

KEYWORDS: Metrology, Algorithm development, Software development, Data modeling, Image processing, Semiconductors, Scanning electron microscopy, Image analysis, Data analysis, Process control

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Proceedings Article | 22 March 2016 Paper

Manufacturability of dense hole arrays with directed self-assembly using the CHIPS flow

Arjun Singh, Jaewoo Nam, Jongsu Lee, Boon Teik Chan, Hengpeng Wu, Jian Yin, Yi Cao, Roel Gronheid

Proceedings Volume 9777, 97770P (2016) https://doi.org/10.1117/12.2219261

KEYWORDS: Optical lithography, Plasma etching, Materials processing, Manufacturing, Lithography, Process control, Directed self assembly, Polymer thin films, Polymethylmethacrylate, Photoresist materials, Cadmium, Electron beam lithography, Critical dimension metrology

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Proceedings Article | 20 March 2015 Paper

Dry development rinse process for ultimate resolution improvement via pattern collapse mitigation

Safak Sayan, Zheng Tao, B. T. Chan, Danilo De Simone, Yuhei Kuwahara, Kathleen Nafus, Michael Leeson, Florian Gstrein, Arjun Singh, Geert Vandenberghe

Proceedings Volume 9425, 942516 (2015) https://doi.org/10.1117/12.2086486

KEYWORDS: Line width roughness, Photoresist materials, Photoresist developing, Photoresist processing, Extreme ultraviolet lithography, Semiconducting wafers, Image processing, Extreme ultraviolet, Liquids, Capillaries

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly process integration: fin patterning approaches and challenges

Safak Sayan, B. T. Chan, Taisir Marzook, Nadia Vandenbroeck, Efrain Sanchez, Roel Gronheid, Arjun Singh, Paulina Delgadillo

Proceedings Volume 9425, 94250R (2015) https://doi.org/10.1117/12.2087318

KEYWORDS: Semiconducting wafers, Optical lithography, Etching, Photomasks, Optical alignment, Scanning electron microscopy, System on a chip, Silicon, Image processing, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

Patterning sub-25nm half-pitch hexagonal arrays of contact holes with chemo-epitaxial DSA guided by ArFi pre-patterns

Arjun Singh, Boon Teik Chan, Doni Parnell, Hengpeng Wu, Jian Yin, Yi Cao, Roel Gronheid

Proceedings Volume 9425, 94250X (2015) https://doi.org/10.1117/12.2086352

KEYWORDS: Etching, Photoresist materials, Polymethylmethacrylate, Optical lithography, Electron beam lithography, Extreme ultraviolet lithography, Plasma, Lithography, Plasma etching, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

Impact of sequential infiltration synthesis on pattern fidelity of DSA lines

Arjun Singh, Werner Knaepen, Safak Sayan, Ziad el Otell, Boon Teik Chan, Jan Maes, Roel Gronheid

Proceedings Volume 9425, 94250N (2015) https://doi.org/10.1117/12.2086091

KEYWORDS: Polymers, Plasma etching, Atomic layer deposition, Picosecond phenomena, Etching, Line edge roughness, Polymethylmethacrylate, Plasma, Polymer thin films, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Using chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact-hole patterns

Arjun Singh, Boon Teik Chan, Yi Cao, Guanyang Lin, Roel Gronheid

Proceedings Volume 9049, 90492F (2014) https://doi.org/10.1117/12.2047285

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Polymethylmethacrylate, Critical dimension metrology, Photoresist materials, Extreme ultraviolet, Etching, Printing, Lithography, Directed self assembly

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Proceedings Article | 29 March 2013 Paper

Rectification of EUV-patterned contact holes using directed self-assembly

Roel Gronheid, Arjun Singh, Todd Younkin, Paulina Rincon Delgadillo, Paul Nealey, Boon Teik Chan, Kathleen Nafus, Ainhoa Romo Negreira, Mark Somervell

Proceedings Volume 8682, 86820A (2013) https://doi.org/10.1117/12.2012667

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Polymethylmethacrylate, Optical lithography, Critical dimension metrology, Photoresist processing, Image processing, Neodymium, Scanning electron microscopy, Directed self assembly

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Proceedings Article | 15 October 2012 Paper

Inkjet printed PEDOT:PSS for organic devices

Arjun Singh, Saumen Mandal, Vandana Singh, Ashish Garg, Monica Katiyar

Proceedings Volume 8549, 854936 (2012) https://doi.org/10.1117/12.928190

KEYWORDS: Printing, Inkjet technology, Glasses, Scanning electron microscopy, Transmittance, Positron emission tomography, Resistance, Transparency, Organic light emitting diodes, Optical testing

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Showing 5 of 10 publications

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