Dr. Armin W. Knoll
at IBM Research Zurich
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12054, PC120540S (2022) https://doi.org/10.1117/12.2624509

Proceedings Article | 1 August 2021 Presentation + Paper
Philippe Nicollier, Christian Schwemmer, Francesca Ruggeri, Daniel Widmer, Xiaoyu Ma, Armin Knoll
Proceedings Volume 11798, 117980M (2021) https://doi.org/10.1117/12.2593705
KEYWORDS: Nanoparticles, Light scattering, Diffusion, Interferometry

Proceedings Article | 21 March 2016 Paper
Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Daniel Wagner, Felix Krohn, Andreas Schedl, Simon Bonanni, Felix Holzner, Colin Rawlings, Urs Dürig, Armin Knoll
Proceedings Volume 9779, 97791C (2016) https://doi.org/10.1117/12.2219080
KEYWORDS: Scanning probe lithography, Molecules, Physical vapor deposition, Polymers, Photoresist materials, Lithography, Resistance, Etching, Crystals, Silicon, Silica, Optical lithography, Thin films

Proceedings Article | 20 March 2015 Paper
Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Andreas Ringk, Tristan Kolb, Andreas Schedl, Vincent Fokkema, Marijn G. van Veghel, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean- François de Marneffe, Ziad el Otell, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow
Proceedings Volume 9425, 94250E (2015) https://doi.org/10.1117/12.2085734
KEYWORDS: Glasses, Scanning probe lithography, Etching, Thin films, Optical lithography, Plasma etching, Resistance, Electron beam lithography, Lithography, Crystals

Proceedings Article | 28 March 2014 Paper
Christian Neuber, Andreas Ringk, Tristan Kolb, Florian Wieberger, Peter Strohriegl, Hans-Werner Schmidt, Vincent Fokkema, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean-Francois de Marneffe, Peter De Schepper, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow
Proceedings Volume 9049, 90491V (2014) https://doi.org/10.1117/12.2047108
KEYWORDS: Glasses, Etching, Scanning probe lithography, Lithography, Optical lithography, Silicon, Electron beam lithography, Polymers, Resistance, Photoresist processing

Proceedings Article | 28 March 2014 Paper
A. Knoll, M. Zientek, L. Cheong, C. Rawlings, P. Paul, F. Holzner, J. Hedrick, D. Coady, R. Allen, U. Dürig
Proceedings Volume 9049, 90490B (2014) https://doi.org/10.1117/12.2046201
KEYWORDS: Optical lithography, Polymers, Lithography, Silicon, Scanning probe lithography, Image resolution, Molecules, Nanolithography, Scanning electron microscopy, Photomasks

Proceedings Article | 1 October 2013 Paper
Felix Holzner, Philip Paul, Michel Despont, Lin Lee Cheong, James Hedrick, Urs Dürig, Armin Knoll
Proceedings Volume 8886, 888605 (2013) https://doi.org/10.1117/12.2032318
KEYWORDS: Electron beam lithography, Optical lithography, Nanolithography, Silicon, Polymers, Scanning probe lithography, Reactive ion etching, Photomasks, Lithography, Scanning electron microscopy

Proceedings Article | 3 April 2010 Paper
David Pires, Armin Knoll, Urs Duerig, Ute Drechsler, Michel Despont, Heiko Wolf, James Hedrick, Ekmini de Silva
Proceedings Volume 7637, 76371E (2010) https://doi.org/10.1117/12.847290
KEYWORDS: Optical lithography, Glasses, Silicon, Reactive ion etching, Lithography, Etching, Electron beam lithography, Molecules, Nanostructures, Sensors

Showing 5 of 8 publications
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