Dr. Arnold W. Yanof
Project Manager at Freescale Semiconductor Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 7 June 2004 Paper
Proc. SPIE. 5301, Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications V
KEYWORDS: CMOS sensors, Eye, Modulation, Visualization, Spatial frequencies, Sensors, Manufacturing, Contrast sensitivity, Contrast transfer function, Visibility

Proceedings Article | 18 August 2000 Paper
Proc. SPIE. 4181, Challenges in Process Integration and Device Technology
KEYWORDS: Lithography, Electron microscopes, Scanning electron microscopy, Standards development

Proceedings Article | 2 June 2000 Paper
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Metrology, Contamination, Manufacturing, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Wafer testing, Standards development

Proceedings Article | 2 June 2000 Paper
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Optical lithography, Defect detection, Visualization, Particles, Inspection, Interference (communication), Optical inspection, Signal processing, Semiconducting wafers

Proceedings Article | 14 June 1999 Paper
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Optical filters, Metrology, Oscillators, Calibration, Metals, Glasses, Silicon, Transmittance, Absorbance, Semiconducting wafers

Showing 5 of 10 publications
Proceedings Volume Editor (2)

Conference Committee Involvement (2)
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
27 February 1989 | San Jose, CA, United States
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
31 January 1988 | Newport Beach, CA, United States
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