Dr. Asher Klatchko Profile

Dr. Asher Klatchko

MTS at Applied Materials Inc

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 16 March 2009 Paper

Overcoming the challenges of 22-nm node patterning through litho-design co-optimization

Martin Burkhardt, J. C. Arnold, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Halle, G. Han, S. Holmes, D. Horak, S. Kanakasabapathy, R. H. Kim, A. Klatchko, C. S. Koay, A. Krasnoperova, Y. Ma, E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Paruchuri, S. Mansfield, C. Spence, M. Colburn

Proceedings Volume 7274, 727404 (2009) https://doi.org/10.1117/12.814433

KEYWORDS: Etching, Lithography, Printing, Optical lithography, Double patterning technology, Resolution enhancement technologies, Logic, Metals, Photomasks, Tolerancing

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Conformal mapping in microlithography

Asher Klatchko, Peter Pirogovsky

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.561106

KEYWORDS: Optical lithography, Raster graphics, Transform theory, Optical proximity correction, Convolution, Image processing, Diffusion, Photomasks, Critical dimension metrology, Chromium

Read Abstract +

Proceedings Article | 17 December 2003 Paper

DUV ALTA system aerial image enhancement for improved pattern fidelity

Paul Allen, Alex Buxbaum, Samuel Howells, Boaz Kenan, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Michael White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518218

KEYWORDS: Artificial intelligence, Image enhancement, Photomasks, Vestigial sideband modulation, Scanning electron microscopy, Optical proximity correction, Deep ultraviolet, Evolutionary algorithms, Manufacturing, Data conversion

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years