Dr. Axel M. Zibold
Head of Global Sales & Customer Support at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Phase shifting, Metrology, Scanners, Image registration, Printing, Photomasks, Phase measurement, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Image acquisition, Data acquisition, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Phase shifting, Optical lithography, Silica, Etching, Scanners, Photomasks, Tantalum, Semiconducting wafers, Phase shifts

Proceedings Article | 21 June 2006 Paper
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Reticles, Polarization, Scanners, Printing, Transmittance, Photomasks, Immersion lithography, Semiconducting wafers, Phase shifts

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Reticles, Polarization, Scanners, Optical testing, Printing, Photomasks, Immersion lithography, Semiconducting wafers, Binary data

Showing 5 of 28 publications
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