Barton A. Katz
at SoniPark LLC
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 17 May 1994 Paper
Proc. SPIE. 2197, Optical/Laser Microlithography VII
KEYWORDS: Lithography, Reticles, Lithium, Manufacturing, Photoresist materials, Photomasks, Computer aided design, Binary data, Phase shifts, Design for manufacturability

Proceedings Article | 8 August 1993 Paper
Proc. SPIE. 1927, Optical/Laser Microlithography
KEYWORDS: Oxides, Lithography, Optical lithography, Metals, Lens design, Photoresist materials, Photomicroscopy, Photoresist processing, Semiconducting wafers, Product engineering

Proceedings Article | 1 June 1992 Paper
Proc. SPIE. 1674, Optical/Laser Microlithography V
KEYWORDS: Lithography, Reticles, Optical lithography, Deep ultraviolet, Metals, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Phase shifts

Proceedings Article | 1 August 1991 Paper
Proc. SPIE. 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
KEYWORDS: Lithography, Optical lithography, Image processing, X-rays, Manufacturing, Ion beams, Photoresist processing, Semiconducting wafers, X-ray lithography, Standards development

Proceedings Article | 1 July 1991 Paper
Proc. SPIE. 1463, Optical/Laser Microlithography IV
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Lenses, Interferometers, Sensors, Particles, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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