Dr. Bassam Shamoun
Engineering Principal at Intel Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 24 February 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Photomasks, Extreme ultraviolet, Line edge roughness, Data conversion, Wafer manufacturing, Roads, Extreme ultraviolet lithography

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Lithography, Electrodes, Overlay metrology, Optical lithography, Manufacturing, Printing, Extreme ultraviolet

Proceedings Article | 15 October 2003 Paper
Proc. SPIE. 5220, Nanofabrication Technologies
KEYWORDS: Photomasks, Lithography, Raster graphics, Electron beam lithography, Mask making, Modulation, Prototyping, Electron beams, Semiconducting wafers, Laser applications

Proceedings Article | 19 July 2000 Paper
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Photomasks, Lithography, Control systems, Electron beam lithography, Critical dimension metrology, Raster graphics, Reticles, Binary data, Line edge roughness, RGB color model

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Distortion, Superposition, Photomasks, Electron beam lithography, Computer simulations, Data modeling, Thermal modeling, Optical lithography, Systems modeling, Astatine

Showing 5 of 9 publications
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