Mr. Benjamin L. Alles Profile

Benjamin L. Alles

at Advanced Mask Technology Ctr

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Publications (2)

Proceedings Article | 19 May 2006 Paper

Pellicle-induced aberrations and apodization in hyper-NA optical lithography

Karsten Bubke, Benjamin Alles, Eric Cotte, Martin Sczyrba, Christophe Pierrat

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Lithography, Monochromatic aberrations, Apodization, Polarization, Birefringence, Pellicles, Photomasks, Optical proximity correction, Sodium, Dielectric polarization

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Proceedings Article | 15 March 2006 Paper

193-nm immersion photomask image placement in exposure tools

Eric Cotte, Benjamin Alles, Timo Wandel, Gunter Antesberger, Silvio Teuber, Manuel Vorwerk, Andreas Frangen, Frank Katzwinkel

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

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