Mr. Benjamin Duclaux Profile

Benjamin Duclaux

Staff Engineer at STMicroelectronics (Crolles II) SAS

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Senior Lithography Research and Development Engineer, working at STMicroelectronics in Crolles (France). Was assignee at Albany (NY) Nanotech center within IBM-GF-Samsung and STMicro alliance. Worked on Lithography process development from 40nm to 7nm logic nodes as well as imaging technology. Now focusing on Overlay and APC for advance fabs.

Publications (4)

Proceedings Article | 27 April 2023 Poster + Paper

Optimizations of APC multivariate algorithm for linear mix and match overlay control

Benjamin Duclaux, Maxime Gatefait, Alice Pelletier, Laurent Lecarpentier, Pierre Leveque, Cédric Monget

Proceedings Volume 12496, 1249627 (2023) https://doi.org/10.1117/12.2655762

KEYWORDS: Scanners, Advanced process control, Mathematical optimization, Overlay metrology, Feedback loops, Process modeling, Lithography

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Proceedings Article | 20 March 2020 Presentation + Paper

Run to run and model variability of overlay high order process corrections for mean intrafield signatures

Benjamin Duclaux, Maxime Gatefait, Olivier Mermet, Jean-Damien Chapon

Proceedings Volume 11325, 113251K (2020) https://doi.org/10.1117/12.2551062

KEYWORDS: Semiconducting wafers, Overlay metrology, Reticles, Scanners, Metrology, Data modeling, Sensors, Data corrections, Process modeling, Performance modeling, Lithographic process control

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Proceedings Article | 20 March 2020 Paper

Mitigating gain, effort and cost for EOW overlay control

Olivier Mermet, Maxime Gatefait, Didier Dabernat, Florent Dettoni, Benjamin Duclaux, Bertrand Le-Gratiet

Proceedings Volume 11325, 113251W (2020) https://doi.org/10.1117/12.2548308

KEYWORDS: Etching, Semiconducting wafers, Scanners, Overlay metrology, Contamination, Lithography, Plasma

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Proceedings Article | 13 March 2018 Presentation + Paper

Approaches of multilayer overlay process control for 28nm FD-SOI derivative applications

Benjamin Duclaux, Jean De Caunes, Robin Perrier, Maxime Gatefait, Bertrand Le Gratiet, Jean-Damien Chapon, Cédric Monget

Proceedings Volume 10585, 105851C (2018) https://doi.org/10.1117/12.2292446

KEYWORDS: Overlay metrology, Optical alignment, Scanners, Process control, Data modeling, Reticles, Reliability, Optical lithography

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