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Dr. Bettine Buechner
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 27 December 2002 Paper
Automated flow for site definition and CD measurement with a SEM for use in mask production
Christian Rotsch, Henning Haffner, Christian Ruebekohl, Bettine Buechner
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468082
KEYWORDS: Reticles, Photomasks, Scanning electron microscopy, Computed tomography, Critical dimension metrology, Pattern recognition, Image registration, Metrology, Visualization, Algorithm development
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