Dr. Bhanwar Singh
SPIE Involvement:
Track Chair | Author
Publications (34)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Etching, Process control, Plasma etching, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Temperature metrology, Plasma

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Etching, Inspection, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 27 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Calibration, Pattern recognition, Scanning electron microscopy, Design for manufacturing, Optical proximity correction, Computer aided design, Algorithm development, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Thin films, Ellipsometry, Oscillators, Data modeling, Optical properties, X-rays, Silicon, Reflectometry, Spectroscopic ellipsometry, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical microscopes, Spatial frequencies, Scanners, Light scattering, Computer simulations, Scatterometry, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

Showing 5 of 34 publications
Proceedings Volume Editor (9)

Showing 5 of 9 publications
Conference Committee Involvement (23)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
28 August 2007 | San Diego, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Showing 5 of 23 Conference Committees
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