Bhardwaj S. Durvasula
SPIE Involvement:
Author
Area of Expertise:
Mask Data Preparation , Mask Process Correction , Computational Geometry
Profile Summary

I have an experience of over 10 years in the MDP (Mask Data Preparation) and MPC (Mask Process Correction) domains, primarily spent solving vast amounts of computational geometry and large data handling problems. I am currently working on the Calibre engine in Mentor. My ongoing research includes understanding the physics of lithography (because I need it), the statistical analysis of big data (because I use it), and machine learning (because every else is doing it).
Publications (8)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Optical proximity correction, Mask making, Electronic design automation

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11613, Optical Microlithography XXXIV
KEYWORDS: Manufacturing, Photomasks, Extreme ultraviolet lithography, Mask making, Semiconducting wafers, Optics manufacturing, EUV optics

Proceedings Article | 16 October 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Waveguides, Data processing, Neural networks, Photomasks, Machine learning, Computational lithography, Optical proximity correction, Vestigial sideband modulation

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Scattering, Calibration, Etching, Control systems, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Photoresist processing, Model-based design, Process modeling

Showing 5 of 8 publications
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