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Bikram Baidya
Software Research Engineering Manager at Intel Corp
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Publications (1)
Proceedings Article | 29 March 2013 Paper
Self-aligned double patterning compliant routing with in-design physical verification flow
Jhih-Rong Gao, Harshdeep Jawandha, Prasad Atkar, Atul Walimbe, Bikram Baidya, Olivier Rizzo, David Pan
Proceedings Volume 8684, 868408 (2013) https://doi.org/10.1117/12.2013245
KEYWORDS: Lithography, Double patterning technology, Photomasks, Manufacturing, Overlay metrology, 193nm lithography, Metals, Design for manufacturability, Detection and tracking algorithms, Design for manufacturing
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